⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4869143 | 0.74 | LMNA (0.33) | — | |
| SCHEMBL2749247 | 0.67 | — | — | |
| SCHEMBL21643734 | 0.67 | — | — | |
| SCHEMBL17004122 | 0.64 | — | — | |
| SCHEMBL1275625 | 0.64 | — | — | |
| SCHEMBL458635 | 0.64 | — | — | |
| SCHEMBL19205820 | 0.61 | — | — | |
| SCHEMBL5925133 | 0.61 | — | — | |
| SCHEMBL1971106 | 0.61 | — | — | |
| SCHEMBL17763364 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3141538-B1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | VERSUM MAT US LLC (US) | 2019-10-30 | — | — | EP | disclosed |
| EP-2318477-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-06-05 | — | — | EP | disclosed |
| US-9758694-B2 | Curable resin composition, cured product thereof, and semiconductor device using the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| EP-3141538-A1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-03-15 | — | — | EP | disclosed |
| EP-3048133-B1 | CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND SEMICONDUCTOR DEVICE USING THE SAME | CENTRAL GLASS CO LTD (JP) | 2017-03-01 | — | — | EP | disclosed |
| EP-2141141-B1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PROD & CHEM (US) | 2016-09-28 | — | — | EP | disclosed |
| US-20160215168-A1 | Curable Resin Composition, Cured Product Thereof, and Semiconductor Device Using the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-07-28 | — | — | US | disclosed |
| EP-3048133-A1 | CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND SEMICONDUCTOR DEVICE USING THE SAME | Central Glass Company, Limited (JP) | 2016-07-27 | — | — | EP | disclosed |
| EP-1931613-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-11-11 | — | — | EP | disclosed |
| EP-1931746-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2013-09-04 | — | — | EP | disclosed |
| WO-2007033075-A9 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-04-29 | — | — | WO | disclosed |
| EP-2141141-A1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | Air Products and Chemicals, Inc. (US) | 2010-01-06 | — | — | EP | disclosed |
| US-20090297711-A1 | Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090291210-A1 | Additives to Prevent Degradation of Cyclic Alkene Derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-11-26 | — | — | US | disclosed |
| EP-1931613-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| EP-1931746-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| WO-2007033075-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| WO-2007033123-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070057234-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |