SCHEMBL105335

SCHEMBL105335

C[O-].C[O-].C[O-].[B+3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methyl Alcohol SCHEMBL10959698 0.82
SCHEMBL1126877 0.75
SCHEMBL489988 0.75
SCHEMBL107861 0.75
SCHEMBL221756 0.75
SCHEMBL25254193 0.75
SCHEMBL450663 0.75
SCHEMBL1406232 0.75
SCHEMBL11298649 0.75
SCHEMBL284767 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 328 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023105545-A1 PROCESS FOR GREEN HYDROGEN PRODUCTION DI BENEDETTO ALMERINDA (IT) 2023-06-15 WO claimed
US-20050172985-A1 Method for Stripping Cured Paint from Low Temperature Plastic Substrates MILES SAMUEL L (US) 2005-08-11 US claimed
US-5449573-A Subbing layer of organometallic compound, silane coupler, binder resin FUJI XEROX CO., LTD. (JP) 1995-09-12 US claimed
US-5275843-A Manufacture of β-BaB2 O4 film by a sol-gel method NGK SPARK PLUG CO., LTD. (JP) 1994-01-04 US claimed
US-4584073-A Process and apparatus for isotopic enrichment using lasers WESTINGHOUSE ELECTRIC CORP. (US) 1986-04-22 US claimed
US-4540512-A Recovery of boric acid from nuclear waste WESTINGHOUSE ELECTRIC CORP. (US) 1985-09-10 US claimed
US-6432191-B1 None US disclosed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4700067-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-25 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260029706-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-29 US disclosed
EP-4621486-A2 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-24 EP disclosed
US-5623030-A Curable composition and process for producing molded articles using the same KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1997-04-22 US disclosed
US-5449573-A Subbing layer of organometallic compound, silane coupler, binder resin FUJI XEROX CO., LTD. (JP) 1995-09-12 US disclosed
US-5393629-A Consists of a conductive support having ligth sensitive layerc containing hydroxygallium phthalocyanine crystals as charge generating material and a charge transporting layer, and a benzidine compound FUJI XEROX CO., LTD. (JP) 1995-02-28 US disclosed
US-4686195-A Method and composition for the manufacture of gradient index glass UNIVERSITY OF ROCHESTER (US) 1987-08-11 US disclosed
US-4584073-A Process and apparatus for isotopic enrichment using lasers WESTINGHOUSE ELECTRIC CORP. (US) 1986-04-22 US disclosed
US-4540512-A Recovery of boric acid from nuclear waste WESTINGHOUSE ELECTRIC CORP. (US) 1985-09-10 US disclosed
EP-0125017-A2 Process for recovering boric acid from nuclear waste WESTINGHOUSE ELECTRIC CORPORATION (US) 1984-11-14 EP disclosed