⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2464884 | 1.00 | — | — | |
| SCHEMBL333324 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL32689472 | 0.95 | — | — | |
| SCHEMBL9480528 | 0.95 | — | — | |
| Fluoride SCHEMBL20869507 | 0.95 | — | — | |
| SCHEMBL1763449 | 0.80 | — | — | |
| SCHEMBL776976 | 0.80 | — | — | |
| SCHEMBL1763447 | 0.80 | — | — | |
| SCHEMBL2836890 | 0.80 | — | — | |
| SCHEMBL18675 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4137 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122010698-A | Preparation method of perfluoromethoxy methylene vinyl ether | 漳平市九鼎泰天科技有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-122011781-A | High-wear-resistance door and window material and preparation method thereof | 四川佳之盾门窗有限公司 | 2026-05-12 | — | — | CN | claimed |
| EP-3688046-B1 | COPOLYMERS OF HALOGENATED OLEFINS AND HALOGENATED CO-MONOMERS | ARKEMA INC (US) | 2026-01-07 | — | — | EP | claimed |
| US-12351911-B2 | Hydrophobic low-dielectric-constant film and preparation method therefor | JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) | 2025-07-08 | — | — | US | claimed |
| CN-120192485-A | Hydrophilic vinylidene fluoride copolymer, preparation method and application | 浙江省化工研究院有限公司 | 2025-06-24 | — | — | CN | claimed |
| CN-120164903-A | Positive plate, preparation method thereof, battery and electric equipment | 比亚迪股份有限公司 | 2025-06-17 | — | — | CN | claimed |
| CN-120165016-A | Lithium iron manganese phosphate battery | 湖州耀宁固态电池研究院有限公司 | 2025-06-17 | — | — | CN | claimed |
| CN-116323187-B | Resin composition and laminate | ＡＧＣ株式会社 | 2025-06-10 | — | — | CN | claimed |
| CN-119767958-A | Silicon-based OLED display panel and preparation method thereof | 南京昀光科技有限公司 | 2025-04-04 | — | — | CN | claimed |
| CN-119490620-A | Weather-resistant fluorocarbon resin, and preparation method and application thereof | 常熟三爱富中昊化工新材料有限公司 | 2025-02-21 | — | — | CN | claimed |
| US-4925733-A | MULTILAYER; CONTAINING PLASMA POLYMERIZED FILM | CANON KABUSHIKI KAISHA (JP) | 1990-05-15 | — | — | US | claimed |
| EP-0092230-B1 | METHOD OF PRODUCING A LYOPHOBIC COATING | SIEMENS AKTIENGESELLSCHAFT (DE) | 1988-01-07 | — | — | EP | claimed |
| US-4673250-A | RADIATION ABSORBING CHEMICAL SCREENING | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1987-06-16 | — | — | US | claimed |
| US-4536179-A | Implantable catheters with non-adherent contacting polymer surfaces | UNIVERSITY OF MINNESOTA (US) | 1985-08-20 | — | — | US | claimed |
| US-4479982-A | Method for producing a lyophobic layer | SIEMENS AKTIENGESELLSCHAFT (DE) | 1984-10-30 | — | — | US | claimed |
| US-4469879-A | Trichloropolyfluoro-bicyclo ethers | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1984-09-04 | — | — | US | claimed |
| US-4327395-A | Metallized polypropylene film capacitor | SHIZUKI ELECTRIC CO., INC. (JP) | 1982-04-27 | — | — | US | claimed |
| US-4175048-A | PERFLUOROCYCLOHEXENE AND HEXAFLUOROAZOMETHANE | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) | 1979-11-20 | — | — | US | claimed |
| US-4153925-A | Dielectric formed by a thin-layer polymer, a process for producing said layer and electrical capacitors comprising this dielectric | THOMSON-CSF (FR) | 1979-05-08 | — | — | US | claimed |
| US-4091166-A | Boron trifluoride coatings for thermoplastic materials and method of applying same in glow discharge | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 1978-05-23 | — | — | US | claimed |