⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1763449 | 1.00 | — | — | |
| SCHEMBL1685077 | 0.89 | — | — | |
| SCHEMBL361643 | 0.89 | — | — | |
| SCHEMBL3657197 | 0.84 | — | — | |
| SCHEMBL3657198 | 0.84 | — | — | |
| SCHEMBL16548528 | 0.83 | — | — | |
| SCHEMBL18924435 | 0.83 | — | — | |
| SCHEMBL2464884 | 0.80 | — | — | |
| SCHEMBL105368 | 0.80 | — | — | |
| SCHEMBL333324 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250343048-A1 | ETCHING METHOD | RESONAC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4481794-A1 | ETCHING METHOD | Resonac Corporation (JP) | 2024-12-25 | — | — | EP | disclosed |
| WO-2023157441-A1 | ETCHING METHOD | 株式会社レゾナック | 2023-08-24 | — | — | WO | disclosed |
| US-8547011-B2 | Layered product, luminescence device and use thereof | ZEON CORPORATION (JP) | 2013-10-01 | — | — | US | disclosed |
| EP-1745922-B1 | MULTILAYER BODY, LIGHT-EMITTING DEVICE AND USE THEREOF | ZEON CORP (JP) | 2012-08-29 | — | — | EP | disclosed |
| EP-1655772-B1 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS FOR PLASMA CVD | TOKYO ELECTRON LTD (JP) | 2011-09-28 | — | — | EP | disclosed |
| US-20110124928-A1 | Gas production facility, gas supply container, and gas for manufacture of electronic devices | ZEON CORPORATION (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7704893-B2 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD | TOKYO EECTRON LIMITED (JP) | 2010-04-27 | — | — | US | disclosed |
| US-7648922-B2 | Fluorocarbon film and method for forming same | KYOTO UNIVERSITY (JP) | 2010-01-19 | — | — | US | disclosed |
| US-20080285144-A1 | Optical Element | ZEON CORPORATION (JP) | 2008-11-20 | — | — | US | disclosed |
| US-20080018230-A1 | Layered Product, Luminescence Device and Use Thereof | ZEON CORPORATION (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20070282142-A1 | Gas Production Facility, Gas Supply Container, And Gas For Manufacture Of Electronic Devices | ZEON CORPORATION (JP) | 2007-12-06 | — | — | US | disclosed |
| EP-1830219-A1 | OPTICAL DEVICE | ZEON CORPORATION (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-20070020951-A1 | Fluorocarbon film and method for forming same | ZEON CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1745922-A1 | MULTILAYER BODY, LIGHT-EMITTING DEVICE AND USE THEREOF | ZEON CORPORATION (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1744092-A1 | APPARATUS FOR PRODUCING GAS, VESSEL FOR SUPPLYING GAS AND GAS FOR USE IN MANUFACTURING ELECTRONIC DEVICE | OHMI, Tadahiro (JP) | 2007-01-17 | — | — | EP | disclosed |
| US-20060264059-A1 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma cvd | ZEON CORPORATION (JP) | 2006-11-23 | — | — | US | disclosed |
| EP-1655772-A1 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS FOR PLASMA CVD | TOKYO ELECTRON LIMITED (JP) | 2006-05-10 | — | — | EP | disclosed |