SCHEMBL1053966

SCHEMBL1053966

C[Si](C)(C)OC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4763507 0.77
SCHEMBL1051432 0.77
SCHEMBL1054207 0.77
SCHEMBL10985445 0.67
SCHEMBL16303837 0.67
SCHEMBL14418639 0.67
SCHEMBL1052175 0.67
SCHEMBL16303833 0.67
SCHEMBL2339156 0.65
SCHEMBL2339164 0.65 NR1H2 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3141538-B1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS VERSUM MAT US LLC (US) 2019-10-30 EP disclosed
EP-2318477-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MAT USA INC (US) 2019-06-05 EP disclosed
EP-3141538-A1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-03-15 EP disclosed
EP-2141141-B1 Improved Process Stability of NBDE Using Substituted Phenol Stabilizers AIR PROD & CHEM (US) 2016-09-28 EP disclosed
EP-1931613-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS (US) 2015-11-11 EP disclosed
US-20150200423-A1 SECONDARY BATTERY, BATTERY PACK, ELECTRIC VEHICLE, POWER STORAGE SYSTEM, POWER TOOL, AND ELECTRONIC DEVICE TOHOKU MURATA MANUFACTURING CO., LTD. (JP) 2015-07-16 US disclosed
EP-1931746-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS (US) 2013-09-04 EP disclosed
US-8252704-B2 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2012-08-28 US disclosed
US-8173213-B2 Process stability of NBDE using substituted phenol stabilizers AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-05-08 US disclosed
US-20110259242-A1 Additives to Prevent Degradation of Cyclic Alkene Derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2011-10-27 US disclosed
EP-1931613-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
EP-1931746-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
WO-2007033075-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
WO-2007033123-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
US-20070057235-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
US-20070057234-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
EP-0934246-B1 METHOD FOR PRODUCING ALPHA-ALKOXY-ALPHA-TRIFLUOROMETHYL-ARYL ACETIC ACID ESTERS AND -ARYL ACETIC ACIDS BAYER AG (DE) 2001-05-16 EP disclosed
US-6162943-A BY REACTING A KETO ESTER WITH TRIFLUOROMETHYLTRIMETHYL SILANE TO FORM A-TRIMETHYLSILOXY-A-TRIFLUOROMETHYL ARYL ACETIC ESTER; REACTING WITH ALKOXIDE TO FORM METAL SALT, AND ALKYLATING; REAGENT FOR DETERMINING OPTICAL PURITY OF AMINES BAYER AKTIENGESELLSCHAFT (DE) 2000-12-19 US disclosed
EP-0934246-A1 METHOD FOR PRODUCING $g(a)-ALKOXY-$g(a)-TRIFLUOROMETHYL-ARYL ACETIC ACID ESTERS AND -ARYL ACETIC ACIDS BAYER AG (DE) 1999-08-11 EP disclosed
WO-1998017622-A1 METHOD FOR PRODUCING α-ALKOXY-α-TRIFLUOROMETHYL-ARYL ACETIC ACID ESTERS AND -ARYL ACETIC ACIDS BAYER AKTIENGESELLSCHAFT (DE) 1998-04-30 WO disclosed