SCHEMBL1054264

SCHEMBL1054264

CO[SiH](OC)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5420209 0.64 ALDH1A1 (0.33)
SCHEMBL1053776 0.62
SCHEMBL467717 0.61
Ethane SCHEMBL5833696 0.61 ALDH1A1 (0.31)
Methane SCHEMBL4884575 0.61 ALDH1A1 (0.31)
SCHEMBL2110340 0.59
SCHEMBL2108768 0.59
Ethylene SCHEMBL5834104 0.59
SCHEMBL2338685 0.59
SCHEMBL19580184 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108139671-B Photosensitive resin composition and cured film prepared therefrom 罗门哈斯电子材料韩国有限公司 2022-02-11 CN disclosed
US-10890846-B2 Photosensitive resin composition and cured film prepared therefrom ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD (KR) 2021-01-12 US disclosed
EP-3141538-B1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS VERSUM MAT US LLC (US) 2019-10-30 EP disclosed
CN-105706000-B Positive type photosensitive organic compound, used it film manufacturing method and electronic component 中央硝子株式会社 2019-09-27 CN disclosed
EP-2318477-B1 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MAT USA INC (US) 2019-06-05 EP disclosed
CN-105764993-B Siliceous heat or Photocurable composition AZ电子材料(卢森堡)有限公司 2019-04-09 CN disclosed
CN-106752233-B A kind of UV solidification multifunctional anti-soil agent 北京海岩兴业混凝土外加剂销售有限公司 2019-01-01 CN disclosed
CN-106752233-B A kind of UV solidification multifunctional anti-soil agent 北京海岩兴业混凝土外加剂销售有限公司 2019-01-01 CN disclosed
CN-106318093-B A kind of multifunctional nano self-cleaning composition and its product 上海微谱化工技术服务有限公司 2018-11-20 CN disclosed
US-20180314153-A1 PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2018-11-01 US disclosed
US-20090291210-A1 Additives to Prevent Degradation of Cyclic Alkene Derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2009-11-26 US disclosed
EP-1931613-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
EP-1931746-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
WO-2007033123-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
WO-2007033075-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
US-20070057235-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
US-20070057234-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
EP-1016933-B1 Carrier for electrophotography, process for production of the carrier and developing agent for electrophotography using the carrier KYOCERA CORP (JP) 2006-08-09 EP disclosed
US-6284421-B1 CHARGING CHARACTERISTICS, DURABILITY, DOES NOT DULL COLOR IMAGE, MOISTURE RESISTANCE IDEMITSU KOSAN CO., LTD. (JP) 2001-09-04 US disclosed
EP-1016933-A2 Carrier for electrophotography, process for production of the carrier and developing agent for electrophotography using the carrier IDEMITSU KOSAN CO., LTD. (JP) 2000-07-05 EP disclosed