⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9825498 | 1.00 | — | — | |
| Oxalic Acid SCHEMBL11791667 | 0.90 | TSHR (0.33) | — | |
| SCHEMBL9432221 | 0.80 | — | — | |
| SCHEMBL4141652 | 0.80 | CA12 (0.32) | — | |
| SCHEMBL17050367 | 0.80 | CA12 (0.32) | — | |
| SCHEMBL4141650 | 0.80 | CA12 (0.32) | — | |
| SCHEMBL14835784 | 0.79 | — | — | |
| SCHEMBL14835782 | 0.79 | — | — | |
| SCHEMBL15927997 | 0.76 | — | — | |
| SCHEMBL8499111 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4692940-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Sumitomo Bakelite Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-12216113-B2 | Method for preparing analysis sample, analysis method, and kit for preparing analysis sample | SHIMADZU CORPORATION (JP) | 2025-02-04 | — | — | US | disclosed |
| US-20240321803-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2024-09-26 | — | — | US | disclosed |
| US-20240272551-A1 | NEGATIVE-TYPE PHOTOSENSITIVE POLYMER, POLYMER SOLUTION, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2024-08-15 | — | — | US | disclosed |
| WO-2022270529-A1 | NEGATIVE PHOTOSENSITIVE POLYMER, POLYMER SOLUTION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE | 住友ベークライト株式会社 | 2022-12-29 | — | — | WO | disclosed |
| WO-2022270527-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE POLMER, CURED FILM AND SEMICONDUCTOR DEVICE | 住友ベークライト株式会社 | 2022-12-29 | — | — | WO | disclosed |
| WO-2022172988-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE | 住友ベークライト株式会社 | 2022-08-18 | — | — | WO | disclosed |
| US-20210164989-A1 | METHOD FOR PREPARING ANALYSIS SAMPLE, ANALYSIS METHOD, AND KIT FOR PREPARING ANALYSIS SAMPLE | SHIMADZU CORPORATION (JP) | 2021-06-03 | — | — | US | disclosed |
| EP-3812767-A1 | METHOD FOR PREPARING ANALYSIS SAMPLE, ANALYSIS METHOD, AND KIT FOR PREPARING ANALYSIS SAMPLE | SHIMADZU CORPORATION (JP) | 2021-04-28 | — | — | EP | disclosed |
| WO-2008005268-A1 | SUBSTITUTED PIPERIDINES THAT INCREASE P53 ACTIVITY AND THE USES THEREOF | SCHERING CORPORATION (US) | 2008-01-10 | — | — | WO | disclosed |
| US-4833163-A | INSECTICIDES, NEMATOCIDES, MITICIDES | ROUSSEL UCLAF (FR) | 1989-05-23 | — | — | US | disclosed |
| US-4547522-A | INSECTICIDE, MITICIDE, FUNGICIDE, BACTERICIDE,OR NEMATOCIDE | ROUSSEL UCLAF (FR) | 1985-10-15 | — | — | US | disclosed |
| US-4431576-A | COSMETICS; TOILETRIES; DETERGENTS; INSECTICIDES; WAXES | ROUSSEL UCLAF (FR) | 1984-02-14 | — | — | US | disclosed |
| US-4402972-A | INSECTICIDES | ROUSSEL UCLAF (FR) | 1983-09-06 | — | — | US | disclosed |
| US-3947274-A | Silver halide photographic material containing an isourea derivative as antifoggant | FUJI PHOTO FILM CO., LTD. (JA) | 1976-03-30 | — | — | US | disclosed |