⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL29094701 | 1.00 | — | — | |
| SCHEMBL9387 | 0.96 | — | — | |
| SCHEMBL54903 | 0.96 | — | — | |
| Hydroxyamine SCHEMBL27483582 | 0.96 | — | — | |
| SCHEMBL362926 | 0.96 | — | — | |
| SCHEMBL5036885 | 0.96 | ALDH1A1 (0.50) | — | |
| Hydrochloric Acid SCHEMBL11081542 | 0.92 | — | — | |
| Water SCHEMBL1690382 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL3270812 | 0.92 | — | — | |
| Ammonia Solution, Strong SCHEMBL16619615 | 0.92 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12557622-B2 | Method for fabricating a semiconductor device with a composite barrier structure | NANYA TECHNOLOGY CORPORATION (TW) | 2026-02-17 | — | — | US | claimed |
| US-12341054-B2 | Method for fabricating semiconductor device with chelating agent | NANYA TECHNOLOGY CORPORATION (TW) | 2025-06-24 | — | — | US | claimed |
| CN-119812512-A | Aqueous zinc ion battery electrolyte and application thereof | 铜陵学院 | 2025-04-11 | — | — | CN | claimed |
| CN-117524975-A | Method for manufacturing semiconductor device | 南亚科技股份有限公司 | 2024-02-06 | — | — | CN | claimed |
| CN-116895517-A | Semiconductor device and method for manufacturing the same | 南亚科技股份有限公司 | 2023-10-17 | — | — | CN | claimed |
| US-20230317514-A1 | SEMICONDUCTOR DEVICE WITH COMPOSITE BARRIER STRUCTURE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2023-10-05 | — | — | US | claimed |
| US-20230317508-A1 | METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH PRE-CLEANING TREATMENT | NANYA TECHNOLOGY CORPORATION (TW) | 2023-10-05 | — | — | US | claimed |
| US-20040009883-A1 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-15 | — | — | US | claimed |
| US-12575404-B2 | Semiconductor device with protection layer and method for fabricating the same | NANYA TECHNOLOGY CORPORATION (TW) | 2026-03-10 | — | — | US | disclosed |
| US-20260055238-A1 | RESIN COMPOSITION FOR SEALING STATOR AND METHOD FOR DISASSEMBLING STATOR | SUMITOMO BAKELITE CO., LTD. (JP) | 2026-02-26 | — | — | US | disclosed |
| US-12557622-B2 | Method for fabricating a semiconductor device with a composite barrier structure | NANYA TECHNOLOGY CORPORATION (TW) | 2026-02-17 | — | — | US | disclosed |
| US-20260040912-A1 | SEMICONDUCTOR DEVICE WITH ISOLATION STRUCTURE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORP (TW) | 2026-02-05 | — | — | US | disclosed |
| US-20260040913-A1 | SEMICONDUCTOR DEVICE WITH ISOLATION STRUCTURE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORP (TW) | 2026-02-05 | — | — | US | disclosed |
| US-12489014-B2 | Method for fabricating semiconductor device with multi-carbon-concentration dielectrics | NANYA TECHNOLOGY CORPORATION (TW) | 2025-12-02 | — | — | US | disclosed |
| CN-1184299-C | Photoresist cleaning composition | MITSUBISHI GAS CHEMICAL K K (JP) | 2005-01-12 | — | — | CN | disclosed |
| US-20040029753-A1 | Resist stripping liquid containing fluorine compound | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-02-12 | — | — | US | disclosed |
| US-20040009883-A1 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-15 | — | — | US | disclosed |
| US-6372410-B1 | FOR USE IN PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS; FOR REMOVING RESIST RESIDUES REMAINING AFTER ETCHING OR ASHING | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-04-16 | — | — | US | disclosed |
| CN-1296064-A | Photoresist cleaning composition | MITSUBISHI GAS CHEMICAL K K (JP) | 2001-05-23 | — | — | CN | disclosed |
| EP-1091254-A2 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-04-11 | — | — | EP | disclosed |