⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8236297 | 1.00 | — | — | |
| SCHEMBL30030690 | 0.82 | — | — | |
| Charcoal, Activated SCHEMBL31474657 | 0.82 | — | — | |
| SCHEMBL11422432 | 0.82 | — | — | |
| SCHEMBL31474642 | 0.82 | — | — | |
| SCHEMBL1207928 | 0.82 | — | — | |
| SCHEMBL32675818 | 0.82 | — | — | |
| SCHEMBL31019848 | 0.82 | — | — | |
| SCHEMBL15913 | 0.71 | — | — | |
| SCHEMBL465227 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 658 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110970302-B | Method for forming semiconductor device | 台湾积体电路制造股份有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-119425819-A | Regeneration method of silicon-arsenic poisoning denitration catalyst | 长春吉电能源科技有限公司 | 2025-02-14 | — | — | CN | claimed |
| US-20240321966-A1 | DEVICE WITH EPITAXIAL SOURCE/DRAIN REGION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-09-26 | — | — | US | claimed |
| CN-116217075-B | Regulation and control slag and regulation and control method for vitrification treatment of dangerous solid wastes | 广东飞南资源利用股份有限公司 | 2024-08-06 | — | — | CN | claimed |
| CN-118028619-A | Combined leaching technology for zinc calcine and zinc oxide smoke dust | 云南驰宏资源综合利用有限公司 | 2024-05-14 | — | — | CN | claimed |
| WO-2023226303-A1 | LIGHT EMITTING CHIP EPITAXIAL STRUCTURE AND MANUFACTURING METHOD THEREFOR, LIGHT EMITTING CHIP AND DISPLAY PANEL | 重庆康佳光电技术研究院有限公司 | 2023-11-30 | — | — | WO | claimed |
| CN-114351243-B | Preparation method of N-type doped silicon single crystal and prepared doped silicon single crystal | 山东有研半导体材料有限公司 | 2023-11-07 | — | — | CN | claimed |
| US-11777003-B2 | Semiconductor structure with wraparound backside amorphous layer | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-10-03 | — | — | US | claimed |
| CN-116110923-B | Method for preparing semiconductor structure and semiconductor structure | 合肥新晶集成电路有限公司 | 2023-06-27 | — | — | CN | claimed |
| CN-116217075-A | Regulation and control slag and regulation and control method for vitrification treatment of dangerous solid wastes | 广东飞南资源利用股份有限公司 | 2023-06-06 | — | — | CN | claimed |
| CN-1164792-C | Gas trapping device of chemical vapor deposition system | 华邦电子股份有限公司 | 2004-09-01 | — | — | CN | claimed |
| US-6682983-B2 | Method of forming a bottom electrode of a capacitor in a memory device | NANYA TECHNOLOGY CORPORATION (TW) | 2004-01-27 | — | — | US | claimed |
| US-20030181016-A1 | METHOD OF FORMING A BOTTOM ELECTRODE OF A CAPACITOR IN A MEMORY DEVICE | NANYA TECHNOLOGY CORPORATION | 2003-09-25 | — | — | US | claimed |
| CN-1379120-A | Gas trapping device of chemical vapor deposition system | HUABANG ELECTRONIC CO LTD (CN) | 2002-11-13 | — | — | CN | claimed |
| US-6218319-B1 | PROVIDING GAS FLOW CONTAINING TETRAETHYLORTHOSILICATE (TEOS) INTO CHAMBER CONTAINING WAFERS TO BE PROCESSED AND SECOND TRIETHYLARSENATE GAS; FLOWING OXYGEN GAS TO FORM ARSENIC SILICON GLASS FILM ON WAFERS | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-17 | — | — | US | claimed |
| EP-0977249-A2 | An improved method of forming an arsenic silicon glass film onto a silicon structure | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-02-02 | — | — | EP | claimed |
| US-6001684-A | Method for forming a capacitor | SIEMENS AKTIENGESELLSCHAFT (DE) | 1999-12-14 | — | — | US | claimed |
| US-5891906-A | Polyacetate-derived phorboids having anti-inflammatory and other uses | PROCYON PHARMACEUTICALS, INC. (US) | 1999-04-06 | — | — | US | claimed |
| CN-1202004-A | Integrated circuit fabrication method | SIEMENS AG (DE) | 1998-12-16 | — | — | CN | claimed |
| EP-0883168-A2 | Method for fabricating a semiconductor memory capacitor | SIEMENS AKTIENGESELLSCHAFT (DE) | 1998-12-09 | — | — | EP | claimed |