SCHEMBL1059568

SCHEMBL1059568

COC(C)(OO)OOC(C)(OC)OO

nearest known ligand 0.41

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8354792 0.82 ALDH1A1 (0.50) ALDH1A1TSHR
SCHEMBL3880928 0.71 ALDH1A1 (0.47) ALDH1A1TSHR
Methyl Alcohol SCHEMBL28833031 0.70 ALDH1A1 (0.46) ALDH1A1TSHR
SCHEMBL90785 0.69
Hydrochloric Acid SCHEMBL28181771 0.65
SCHEMBL372797 0.65
SCHEMBL238147 0.62 ALDH1A1 (0.46) ALDH1A1TSHR
SCHEMBL18644469 0.62 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL11749835 0.62 ALDH1A1 (0.44) ALDH1A1TSHR
Tert-Butyl Hydroperoxide SCHEMBL788774 0.60 ALDH1A1 (1.00) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116783225-A Curable composition 株式会社LG化学 2023-09-19 CN disclosed
CN-116075529-A Method for producing aromatic ether compound having vinyl group 日铁化学材料株式会社 2023-05-05 CN disclosed
CN-111690001-A Phosphorus-containing vinylbenzyl ether compound, process for producing the same, resin composition, and laminate for circuit board 日铁化学材料株式会社 2020-09-22 CN disclosed
CN-111217556-A Photovoltaic pavement material and preparation method thereof 汉能移动能源控股集团有限公司 2020-06-02 CN disclosed
EP-2841255-B1 RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS CANON KK (JP) 2020-05-13 EP disclosed
US-9475229-B2 Resin production method and resin production apparatus CANON KABUSHIKI KAISHA (JP) 2016-10-25 US disclosed
CN-104487229-B RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS 佳能株式会社 2016-10-05 CN disclosed
US-20150140227-A1 RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS CANON KABUSHIKI KAISHA (JP) 2015-05-21 US disclosed
CN-104487229-A Resin production method and resin production apparatus CANON KK 2015-04-01 CN disclosed
EP-2841255-A1 RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS Canon Kabushiki Kaisha (JP) 2015-03-04 EP disclosed
US-20100316889-A1 CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE CURABLE COMPOSITION SHOWA DENKO K.K. (JP) 2010-12-16 US disclosed
US-20100258983-A1 EPOXY GROUP-CONTAINING ORGANOSILOXANE COMPOUND, CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE COMPOSITION SHOWA DENKO K.K. (JP) 2010-10-14 US disclosed
EP-2218724-A1 EPOXY GROUP-CONTAINING ORGANOSILOXANE COMPOUND, CURABLE COMPOSITION FOR TRANSFER MATERIAL, AND FINE PATTERN FORMING METHOD USING THE COMPOSITION Showa Denko K.K. (JP) 2010-08-18 EP disclosed
US-20100097715-A1 NANOIMPRINTING RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2010-04-22 US disclosed
EP-1285947-B1 ANTIMICROBIAL COMPOSITION KURARAY CO (JP) 2008-02-20 EP disclosed
WO-2006013989-A1 CURABLE TRIAZINE COMPOSITION FOR ELECTRONIC COMPONENTS, PRODUCTION METHOD THEREFOR AND CURED PRODUCT THEREOF SHOWA DENKO K.K. (JP) 2006-02-09 WO disclosed
EP-1269968-B1 Dental cement composition KURARAY CO (JP) 2005-10-12 EP disclosed
US-20030064102-A1 Antimicrobial Composition NAKATSUKA KAZUMITSU (JP) 2003-04-03 US disclosed
EP-1285947-A1 ANTIMICROBIAL COMPOSITION KURARAY CO., LTD. (JP) 2003-02-26 EP disclosed
EP-1269968-A1 Dental cement composition KURARAY CO., LTD. (JP) 2003-01-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030064102-A1 Antimicrobial Composition AAAS, H1-0, H1-10 ALDH1A1 1315/4885TSHR 4699/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.