SCHEMBL106000

SCHEMBL106000

O=Nc1ccccc1NO.[AlH3]

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 4/20 0.38
LMNA P02545 3/20 0.38
ALDH1A1 P00352 3/20 0.37
HSD17B10 Q99714 2/20 0.37
IDO1 P14902 1/20 0.33
SIGMAR1 Q99720 6/20 0.33
GRIN2D O15399 3/20 0.33
GRIN3B O60391 3/20 0.33
GRIN1 Q05586 3/20 0.33
GRIN2A Q12879 3/20 0.33
GRIN2B Q13224 3/20 0.33
GRIN2C Q14957 3/20 0.33
GRIN3A Q8TCU5 3/20 0.33
GAA P10253 2/20 0.33
KDM4E B2RXH2 3/20 0.32
TDP1 Q9NUW8 2/20 0.32
SMN1; SMN2 Q16637 4/20 0.32
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
ALOX15 P16050 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105074 0.98 HTT (0.39) HTTLMNAALDH1A1HSD17B10IDO1
SCHEMBL8677252 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1
Hydrochloric Acid SCHEMBL1719169 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1
SCHEMBL8680757 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1
SCHEMBL1815831 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1
SCHEMBL101947 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1
Ammonia Solution, Strong SCHEMBL103629 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1
SCHEMBL21670425 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1
SCHEMBL21670429 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1
SCHEMBL105654 0.95 HTT (0.38) HTTLMNAALDH1A1HSD17B10IDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2118 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250026917-A1 ULTRAVIOLET-CURABLE RESIN COMPOSITION, ADHESIVE, SEALANT, INSULATING PROTECTIVE AGENT, AND ELECTRONIC CIRCUIT BOARD PELNOX, LTD. (JP) 2025-01-23 US claimed
WO-2023185530-A1 DRY FILM RESIST, PHOTOSENSITIVE DRY FILM, AND COPPER CLAD LAMINATE 杭州福斯特电子材料有限公司 2023-10-05 WO claimed
US-20230212443-A1 RESIN COMPOSITION AND CURED PRODUCT THEREOF HENKEL AG & CO KGAA (DE) 2023-07-06 US claimed
CN-116184763-A Photocurable resin composition and application thereof 杭州福斯特电子材料有限公司 2023-05-30 CN claimed
CN-115968392-A Resin composition and cured product thereof 汉高股份有限及两合公司 2023-04-14 CN claimed
WO-2023038003-A1 ULTRAVIOLET-CURABLE RESIN COMPOSITION, ADHESIVE, SEALANT, INSULATING PROTECTIVE AGENT, AND ELECTRONIC CIRCUIT BOARD 荒川化学工業株式会社 2023-03-16 WO claimed
WO-2023038001-A1 ULTRAVIOLET-CURABLE RESIN COMPOSITION, ADHESIVE, SEALANT, INSULATING PROTECTIVE AGENT, AND ELECTRONIC CIRCUIT BOARD 荒川化学工業株式会社 2023-03-16 WO claimed
EP-3694842-B1 PROCESS FOR PREPARING 2,5-FURANDICARBOXYLIC ACID SYNPHABASE AG (CH) 2023-01-25 EP claimed
US-20220372181-A1 INFRARED CUT-OFF FILTER, SOLID-STATE IMAGE SENSOR FILTER, SOLID-STATE IMAGE SENSOR, AND METHOD FOR PRODUCING SOLID-STATE IMAGE SENSOR FILTER TOPPAN INC. (JP) 2022-11-24 US claimed
US-11421063-B2 Preformed stabilizers with improved stability COVESTRO LLC (US) 2022-08-23 US claimed
EP-2664611-A1 Method for producing alpha,beta-unsaturated carboxylic acid-N,N-disubstituted amide and method for producing 3-alkoxycarboxylic acid-N,N-disubstituted amide Idemitsu Kosan Co., Ltd (JP) 2013-11-20 EP claimed
US-20120088931-A1 METHOD FOR PRODUCING ALPHA,BETA-UNSATURATED CARBOXYLIC ACID-N,N-DISUBSTITUTED AMIDE AND METHOD FOR PRODUCING 3-ALKOXYCARBOXYLIC ACID-N,N-DISUBSTITUTED AMIDE IDEMITSU KOSAN CO., LTD. (JP) 2012-04-12 US claimed
EP-2426103-A1 METHOD FOR PRODUCING ALPHA, BETA-UNSATURATED CARBOXYLIC ACID-N,N-DISUBSTITUTED AMIDE AND METHOD FOR PRODUCING 3-ALKOXYCARBOXYLIC ACID-N,N-DISUBSTITUTED AMIDE Idemitsu Kosan Co., Ltd. (JP) 2012-03-07 EP claimed
US-7067691-B2 reacting an alpha-substituted acrylic acid anhydride with a 1,1-bis(trifluoromethyl)-1,3-diol to produce a 1-optionally substituted 4,4-bis(trifluoromethyl)-3-hydroxy-2-butyl ester of an optionally 2-substituted acrylic acid CENTRAL GLASS CO., LTD. (JP) 2006-06-27 US claimed
EP-0656030-B1 STABILIZER SYSTEM FOR THIOL-ENE AND THIOL-NENE COMPOSITIONS LOCTITE CORP (US) 2000-07-12 EP claimed
US-5876805-A CONTAINING FREE RADICAL POLYMERIZABLE UNSATURATED COMPOUNDS MINNESOTA MINING & MANUFACTURING CO. (US) 1999-03-02 US claimed
EP-0656030-A4 STABILIZER SYSTEM FOR THIOL-ENE AND THIOL-NENE COMPOSITIONS. LOCTITE CORP (US) 1995-12-13 EP claimed
US-5459173-A Heat resistant stabilizers LOCTITE CORPORATION (US) 1995-10-17 US claimed
EP-0656030-A1 STABILIZER SYSTEM FOR THIOL-ENE AND THIOL-NENE COMPOSITIONS LOCTITE CORPORATION (US) 1995-06-07 EP claimed
WO-1995000579-A1 STABILIZER SYSTEM FOR THIOL-ENE AND THIOL-NENE COMPOSITIONS LOCTITE CORPORATION (US) 1995-01-05 WO claimed