SCHEMBL10604341

SCHEMBL10604341

C=CC(N)[SiH](C)[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9241486 0.75
SCHEMBL327250 0.67
SCHEMBL4256869 0.65
SCHEMBL11036078 0.63
SCHEMBL130823 0.58
SCHEMBL59910 0.58
SCHEMBL15015245 0.58
SCHEMBL2574912 0.58
SCHEMBL5515951 0.58
SCHEMBL87668 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0094050-B1 ULTRATHIN FILM, PROCESS FOR PRODUCTION THEREOF, AND USE THEREOF FOR CONCENTRATING A SPECIFIED GAS IN A GASEOUS MIXTURE TEIJIN LIMITED (JP) 1989-09-27 EP disclosed
US-4644046-A BLEND OF SILICON CONTAINING POLYAMINE, POLYSILOXANE, AND DIISOCYNATE GROUP TEIJIN LIMITED (JP) 1987-02-17 US disclosed
US-4493714-A SILICON CONTAINING POLYUREAS TEIJIN LIMITED (JP) 1985-01-15 US disclosed
EP-0094050-A2 Ultrathin film, process for production thereof, and use thereof for concentrating a specified gas in a gaseous mixture TEIJIN LIMITED (JP) 1983-11-16 EP disclosed