SCHEMBL106500

SCHEMBL106500

Cc1cccc(CO[SiH3])c1C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
TRPA1 O75762 1/20 0.38
ATM Q13315 1/20 0.38
MAPT P10636 3/20 0.36
GAA P10253 2/20 0.36
MAPK1 P28482 2/20 0.36
TP53 P04637 1/20 0.36
HSD17B10 Q99714 1/20 0.36
HTR1B P28222 1/20 0.35
TAAR1 Q96RJ0 1/20 0.34
CYP1A2 P05177 1/20 0.33
CYP2A6 P11509 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
CD38 P28907 1/20 0.33
FFAR1 O14842 1/20 0.33
P2RX7 Q99572 1/20 0.33
TSHR P16473 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11760305 0.82 ESR1 (0.47) ESR1ESR2TRPA1ATMMAPT
SCHEMBL2931888 0.82 ESR1 (0.47) ESR1ESR2TRPA1ATMMAPT
SCHEMBL710879 0.82 TAAR1 (0.46) TAAR1KMT2ATSHRALDH1A1
SCHEMBL2089504 0.80 ESR1 (0.46) ESR1ESR2TRPA1ATMMAPT
SCHEMBL9317901 0.79 ESR1 (0.39) ESR1ESR2TRPA1ATMMAPT
SCHEMBL3423206 0.78 ESR1 (0.49) ESR1ESR2TRPA1ATMMAPT
SCHEMBL2089501 0.78 ESR1 (0.44) ESR1ESR2TRPA1ATMMAPT
SCHEMBL28860149 0.78 SCN8A (0.38) GAAMAPK1CYP1A2TSHRALDH1A1
SCHEMBL8750528 0.75 ESR1 (0.42) ESR1ESR2TRPA1ATMMAPT
SCHEMBL6547407 0.74 ESR1 (0.47) ESR1ESR2TRPA1ATMMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 322 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4634324-A1 AMPHIPHILIC ABRASIVE PARTICLES AND THEIR USE FOR CHEMICAL MECHANICAL PLANARIZATION Versum Materials US, LLC (US) 2025-10-22 EP claimed
CN-119431794-A Organosilicon tackifier and preparation method and application thereof 杭州之江有机硅化工有限公司 2025-02-14 CN claimed
CN-117866204-B Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-12-13 CN claimed
CN-119100394-A Method for preparing high-purity nano silicon carbide powder by combining microwave heating technology with self-suspension carbothermal reduction technology 绍兴晶彩科技有限公司 2024-12-10 CN claimed
WO-2024129435-A1 AMPHIPHILIC ABRASIVE PARTICLES AND THEIR USE FOR CHEMICAL MECHANICAL PLANARIZATION VERSUM MATERIALS US, LLC (US) 2024-06-20 WO claimed
CN-117866205-A Silicon-containing surface modifier and resist underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-04-12 CN claimed
CN-117866204-A Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-04-12 CN claimed
CN-117327281-A Core-shell type organic silicon resin and ink prepared from same for packaging flexible OLED display thin film 江苏广信感光新材料股份有限公司 2024-01-02 CN claimed
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN claimed
CN-116120777-A Preparation method of modified silica sol for water-based ink 山东科翰硅源新材料有限公司 2023-05-16 CN claimed
CN-114456385-A Preparation method of MDT (methyl phenyl silicone oil) for cosmetics 湖南科技学院 2022-05-10 CN claimed
CN-109320720-B Anhydrous synthesis preparation method of MQ type organic silicon resin 深圳市广业电子科技有限公司 2021-05-04 CN claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
EP-0457175-B1 Method of purification of alkoxysilanes TOSHIBA SILICONE (JP) 1997-02-12 EP claimed
US-5104999-A METHOD OF PURIFICATION OF ALKOXYSILANES TOSHIBA SILICONE CO., LTD. (JP) 1992-04-14 US claimed
EP-0457175-A2 Method of purification of alkoxysilanes TOSHIBA SILICONE CO., LTD. (JP) 1991-11-21 EP claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4529545-B1 CURABLE POLYORGANOSILOXANE COMPOSITION INCLUDING A PHOSPHONIUM SALT AND METHODS FOR THE PREPARATION AND USE THEREOF DOW GLOBAL TECHNOLOGIES LLC (US) 2026-03-18 EP disclosed
WO-1981003496-A1 OPTICALLY CLEAR SILICONE COMPOSITIONS CURABLE TO ELASTOMERS DOW CORNING (US) 1981-12-10 WO disclosed
WO-1981003485-A1 METHOD FOR PRODUCING HYDROPHOBIC REINFORCING SILICA FILLERS AND FILLERS OBTAINED THEREBY DOW CORNING (US) 1981-12-10 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 ESR1 249/4885ESR2 284/4885TRPA1 4246/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.