Linolenic Acid

Linolenic Acid

SCHEMBL106610

CC/C=C\C/C=C\C/C=C\CCCCCCCC(=O)O.[LiH]

nearest known ligand 0.96

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.96
PPARG P37231 8/20 0.96
F7 P08709 7/20 0.96
F3 P13726 7/20 0.96
CYP19A1 P11511 6/20 0.96
PPARD Q03181 6/20 0.96
PPARA Q07869 6/20 0.96
MAPT P10636 5/20 0.96
FFAR1 O14842 5/20 0.96
PTGS1 P23219 4/20 0.96
OXER1 Q8TDS5 4/20 0.96
LMNA P02545 4/20 0.96
ALOX15 P16050 4/20 0.96
HSD17B10 Q99714 4/20 0.96
KMT2A Q03164 3/20 0.96
KDM4E B2RXH2 3/20 0.96
CYP3A4 P08684 3/20 0.96
HPGD P15428 3/20 0.96
TDP1 Q9NUW8 3/20 0.96
L3MBTL1 Q9Y468 3/20 0.96

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23698169 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23698132 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23698219 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23698246 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23720511 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23698137 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23698164 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23698135 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23698134 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1
SCHEMBL23698171 0.98 ALDH1A1 (1.00) ALDH1A1PPARGF7F3CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116514077-A Preparation method of lithium bis (fluorosulfonyl) imide 多氟多新材料股份有限公司 2023-08-01 CN claimed
CN-102559587-A Preparing method of iPS cell and medium for preparing iPS cell SHANGHAI INST MATERIA MEDICA 2012-07-11 CN claimed
EP-4357405-A1 NUCLEATING AGENT COMPOSITION, RESIN COMPOSITION, MOLDED ARTICLE THEREOF, AND METHOD FOR MANUFACTURING RESIN COMPOSITION ADEKA CORPORATION (JP) 2024-04-24 EP disclosed
CN-117580906-A Nucleating agent composition, resin composition, molded article thereof, and method for producing resin composition 株式会社ADEKA 2024-02-20 CN disclosed
CN-115335447-B Nucleating agent, resin composition, method for producing resin composition, and molded article 株式会社ADEKA 2023-12-29 CN disclosed
CN-116514077-A Preparation method of lithium bis (fluorosulfonyl) imide 多氟多新材料股份有限公司 2023-08-01 CN disclosed
WO-2023127938-A1 RESIN COMPOSITION, MOLDED ARTICLE AND METHOD FOR PRODUCING RESIN COMPOSITION 株式会社ADEKA 2023-07-06 WO disclosed
US-20230124644-A1 NUCLEATING AGENT, RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, AND MOLDED ARTICLE ADEKA CORPORATION (JP) 2023-04-20 US disclosed
EP-4130128-A1 NUCLEATING AGENT, RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, AND MOLDED ARTICLE ADEKA CORPORATION (JP) 2023-02-08 EP disclosed
WO-2022265042-A1 NUCLEATING AGENT COMPOSITION, RESIN COMPOSITION, MOLDED ARTICLE THEREOF, AND METHOD FOR MANUFACTURING RESIN COMPOSITION 株式会社ADEKA 2022-12-22 WO disclosed
CN-106471061-B Polylactic acid composition, molded body obtained from polylactic acid composition, and method for producing polylactic acid composition 帝人株式会社 2021-06-08 CN disclosed
US-20080026322-A1 Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film SHIN-ETSU CHEMICAL CO., LTD. 2008-01-31 US disclosed
EP-1867681-A1 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Shin-Etsu Chemical Co., Ltd. (JP) 2007-12-19 EP disclosed
EP-1845132-A2 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Shinetsu Chemical Co., Ltd. (JP) 2007-10-17 EP disclosed
US-20070238300-A1 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method SHIN-ETSU CHEMICAL CO., LTD. 2007-10-11 US disclosed
EP-1581270-A2 SILK-CONTAINING STENT GRAFT ANGIOTECH INTERNATIONAL AG (CH) 2005-10-05 EP disclosed
WO-2004060424-A2 SILK-CONTAINING STENT GRAFT ANGIOTECH INTERNATIONAL AG (CH) 2004-07-22 WO disclosed
EP-0416321-B1 Crystalline polyolefin composition CHISSO CORP (JP) 1994-11-09 EP disclosed
US-5063264-A Molding materials CHISSO CORPORATION (JP) 1991-11-05 US disclosed
EP-0416321-A1 Crystalline polyolefin composition Chisso Corporation (JP) 1991-03-13 EP disclosed