⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1066676 | 0.70 | — | — | |
| SCHEMBL1066037 | 0.70 | — | — | |
| SCHEMBL6708067 | 0.70 | — | — | |
| SCHEMBL1066644 | 0.68 | — | — | |
| SCHEMBL1065648 | 0.68 | — | — | |
| SCHEMBL15302345 | 0.64 | — | — | |
| SCHEMBL1066832 | 0.64 | — | — | |
| SCHEMBL1065653 | 0.63 | — | — | |
| SCHEMBL6708064 | 0.63 | — | — | |
| SCHEMBL6562478 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2278612-B1 | Material composed of organosilane or organosiloxane compound for insulating film, its production method and semiconductor device | TOSOH CORP (JP) | 2014-12-10 | — | — | EP | disclosed |
| EP-2278612-A2 | Material composed of organosilane or organosiloxane compound for insulating film, its production method and semiconductor device | Tosoh Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |