⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL812711 | 0.90 | — | — | |
| SCHEMBL15489638 | 0.87 | TDP1 (0.34) | — | |
| SCHEMBL5467568 | 0.84 | TDP1 (0.39) | — | |
| SCHEMBL6558184 | 0.84 | — | — | |
| SCHEMBL253114 | 0.84 | TSHR (0.37) | — | |
| SCHEMBL8093873 | 0.82 | DNM1 (0.43) | — | |
| SCHEMBL3384075 | 0.82 | USP2 (0.41) | — | |
| SCHEMBL11049356 | 0.82 | TDP1 (0.47) | — | |
| SCHEMBL27607732 | 0.82 | TSHR (0.36) | — | |
| SCHEMBL27928001 | 0.82 | TSHR (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 301 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9164383-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | claimed |
| US-9091914-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-28 | — | — | US | claimed |
| CN-103857751-A | Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film | DONGWOO FINE CHEM CO LTD | 2014-06-11 | — | — | CN | claimed |
| CN-102875508-A | Process for extracting flavonoids of lotus leaves | NANTONG SIHAI PLANT EXTRACTS CO LTD | 2013-01-16 | — | — | CN | claimed |
| US-20120208127-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-16 | — | — | US | claimed |
| US-20120208125-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-16 | — | — | US | claimed |
| WO-2025071108-A1 | RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2025-04-03 | — | — | WO | disclosed |
| WO-2024158178-A1 | THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-08-02 | — | — | WO | disclosed |
| US-20240241445-A1 | Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| WO-2024147537-A1 | RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-07-11 | — | — | WO | disclosed |
| US-12034122-B2 | Electrolytic solution for lithium-ion secondary battery and lithium-ion secondary battery | MURATA MANUFACTURING CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-118307578-A | Metal-containing film forming compound, metal-containing film forming composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-09 | — | — | CN | disclosed |
| EP-4390548-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-5891965-A | CURABLE COMPOSITION | DYNEON LLC (US) | 1999-04-06 | — | — | US | disclosed |
| EP-0875781-A2 | Liquid crystal alignment layer, production method for the same, and liquid crystal display device comprising the same | JSR Corporation (JP) | 1998-11-04 | — | — | EP | disclosed |
| WO-1998030631-A1 | PERFLUOROETHER-CONTAINING FLUOROELASTOMERS WITH GOOD LOW TEMPERATURE CHARACTERISTICS | DYNEON LLC (US) | 1998-07-16 | — | — | WO | disclosed |
| EP-0840161-A1 | LIQUID CRYSTAL ALIGNING AGENT | JSR Corporation (JP) | 1998-05-06 | — | — | EP | disclosed |
| US-5268489-A | Reacting a cyclic diene with an actlated ester | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1993-12-07 | — | — | US | disclosed |
| EP-0520419-A2 | Production of unsaturated cycloaliphatic esters and derivatives thereof | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1992-12-30 | — | — | EP | disclosed |
| US-4000258-A | INSECTICIDES, ALCOHOLS, POLYOXYETHYLENE (PROPYLENE) GLYCOL | SANDOZ, INC. (US) | 1976-12-28 | — | — | US | disclosed |