Tetrabuthylammonium

Tetrabuthylammonium

SCHEMBL106827

CCCCC(=O)[O-].CCCC[N+](CCCC)(CCCC)CCCC

nearest known ligand 0.70

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.70
SLC22A1 O15245 1/20 0.55
FABP3 P05413 6/20 0.53
BBOX1 O75936 2/20 0.52
NFKB1 P19838 1/20 0.52
FFAR3 O14843 1/20 0.50
HDAC3 O15379 1/20 0.50
HDAC1 Q13547 1/20 0.50
HDAC2 Q92769 1/20 0.50
HDAC8 Q9BY41 1/20 0.50
CES2 O00748 1/20 0.50
CES1 P23141 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrabuthylammonium SCHEMBL31055833 1.00 CA1 (0.70) CA1SLC22A1FABP3BBOX1NFKB1
Tetrabuthylammonium SCHEMBL104375 0.95 CA1 (0.62) CA1SLC22A1FABP3BBOX1NFKB1
Tetrabuthylammonium SCHEMBL106828 0.95 CA1 (0.62) CA1SLC22A1FABP3BBOX1NFKB1
Tetrabuthylammonium SCHEMBL108841 0.95 CA1 (0.62) CA1SLC22A1FABP3BBOX1NFKB1
Tetrabuthylammonium SCHEMBL106487 0.93 FABP3 (0.62) CA1SLC22A1FABP3CES2CES1
Tetrabuthylammonium SCHEMBL2230010 0.93 FABP3 (0.62) CA1SLC22A1FABP3CES2CES1
Stearic Acid SCHEMBL109143 0.93 FABP3 (0.62) CA1SLC22A1FABP3CES2CES1
Behenic Acid SCHEMBL737441 0.93 FABP3 (0.62) CA1SLC22A1FABP3CES2CES1
Tetrabuthylammonium SCHEMBL105341 0.93 FABP3 (0.62) CA1SLC22A1FABP3CES2CES1
Tetrabuthylammonium SCHEMBL8778043 0.93 FABP3 (0.62) CA1SLC22A1FABP3CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250188334-A1 COLD STORAGE MATERIAL PANASONIC HOLDINGS CORPORATION (JP) 2025-06-12 US disclosed
EP-4484518-A1 COLD STORAGE MATERIAL Panasonic Holdings Corporation (JP) 2025-01-01 EP disclosed
WO-2023162972-A1 COLD STORAGE MATERIAL パナソニックホールディングス株式会社 2023-08-31 WO disclosed
EP-2426558-B1 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process SHINETSU CHEMICAL CO (JP) 2018-10-24 EP disclosed
EP-2500775-B1 PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR SHINETSU CHEMICAL CO (JP) 2018-01-03 EP disclosed
US-8951711-B2 Patterning process and composition for forming silicon-containing film usable therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-10 US disclosed
US-20140342289-A1 PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-20 US disclosed
US-8852844-B2 Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-07 US disclosed
US-8835102-B2 Patterning process and composition for forming silicon-containing film usable therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-16 US disclosed
EP-2172807-B1 Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process SHINETSU CHEMICAL CO (JP) 2014-06-18 EP disclosed
US-20070238300-A1 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method SHIN-ETSU CHEMICAL CO., LTD. 2007-10-11 US disclosed
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20060058380-A1 Novel aminobenzophenone compounds OTTOSEN ERIK R 2006-03-16 US disclosed
EP-1583735-A2 NOVEL AMINOBENZOPHENONE COMPOUNDS Leo Pharma A/S (DK) 2005-10-12 EP disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed
WO-2004056762-A2 NOVEL AMINOBENZOPHENONE COMPOUNDS LEO PHARMA A/S (DK) 2004-07-08 WO disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060058380-A1 Novel aminobenzophenone compounds NFKBIA, IL4I1, ALDH7A1 CA1 4856/4885SLC22A1 1506/4885FABP3 1222/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.