SCHEMBL1070259

SCHEMBL1070259

BrC(Br)=C(Br)C(Br)(Br)Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6351636 0.80
SCHEMBL12486991 0.70
SCHEMBL12485911 0.66
SCHEMBL12486826 0.66
SCHEMBL12486780 0.66
SCHEMBL11026291 0.65
SCHEMBL396876 0.64
SCHEMBL465123 0.62 ALDH1A1 (0.35)
SCHEMBL163344 0.62
SCHEMBL18243540 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4722290-A1 FLUORORUBBER COMPOSITION AND CROSSLINKED MOLDED OBJECT FORMED THEREFROM Zeon Corporation (JP) 2026-04-08 EP disclosed
WO-2024242013-A1 FLUORORUBBER COMPOSITION AND CROSSLINKED MOLDED OBJECT FORMED THEREFROM 日本ゼオン株式会社 2024-11-28 WO disclosed
EP-3807090-B1 METHOD FOR MANUFACTURING A THREE-DIMENSIONAL OBJECT USING A POLY(ARYL ETHER SULFONE) POLYMER AND A PER(HALO)FLUOROPOLYMER SOLVAY SPECIALTY POLYMERS USA (US) 2024-01-24 EP disclosed
CN-113099720-B Method for making three-dimensional objects using poly (aryl ether sulfone) (PAES) polymers 索尔维特殊聚合物美国有限责任公司 2023-04-11 CN disclosed
CN-113099720-A Method for making three-dimensional objects using poly (aryl ether sulfone) (PAES) polymers 索尔维特殊聚合物美国有限责任公司 2021-07-09 CN disclosed
EP-3807090-A1 METHOD OF MAKING A THREE-DIMENSIONAL OBJECT USING A POLY(ARYL ETHER SULFONE) (PAES) POLYMER Solvay Specialty Polymers USA, LLC. (US) 2021-04-21 EP disclosed
EP-2738862-B1 ELECTROLYTE SOLUTION FOR ELECTROCHEMICAL DEVICES FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-12-16 EP disclosed
WO-2019243217-A1 METHOD OF MAKING A THREE-DIMENSIONAL OBJECT USING A POLY(ARYL ETHER SULFONE) (PAES) POLYMER SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2019-12-26 WO disclosed
US-10451967-B2 Acid- and radical-generating agent and method for generating acid and radical FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-22 US disclosed
EP-2328951-B1 FLEXIBLE PIPES MADE OF A POLYARYLETHERKETONE / PERFLUOROPOLYMER COMPOSITION SOLVAY SPECIALTY POLYMERS USA (US) 2018-07-11 EP disclosed
WO-2012118233-A1 ADDITION POLYMERIZATION METHOD, PREPOLYMERIZED CATALYTIC COMPONENT FOR ADDITION POLYMERIZATION, AND METHOD FOR PRODUCING ADDITION POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-09-07 WO disclosed
EP-2276792-B1 FIRE RESISTANT, HIGH FLOW POLY(ARYL ETHER SULFONE) COMPOSITION SOLVAY ADVANCED POLYMERS LLC (US) 2011-09-21 EP disclosed
US-20110168288-A1 Flexible pipes made of a polyaryletherketone/perfluoropolymer composition SOLVAY ADVANCED POLYMERS, L.L.C. (US) 2011-07-14 US disclosed
EP-2328951-A1 FLEXIBLE PIPES MADE OF A POLYARYLETHERKETONE / PERFLUOROPOLYMER COMPOSITION Solvay Advanced Polymers, L.L.C. (US) 2011-06-08 EP disclosed
US-20110060093-A1 Fire resistant, high flow poly(aryl ether sulfone) composition SOLVAY ADVANCED POLYMERS, L.L.C. (US) 2011-03-10 US disclosed
EP-2276792-A1 FIRE RESISTANT, HIGH FLOW POLY(ARYL ETHER SULFONE) COMPOSITION Solvay Advanced Polymers, L.L.C. (US) 2011-01-26 EP disclosed
WO-2010031844-A1 FLEXIBLE PIPES MADE OF A POLYARYLETHERKETONE / PERFLUOROPOLYMER COMPOSITION SOLVAY ADVANCED POLYMERS, L.L.C. (US) 2010-03-25 WO disclosed
WO-2009135893-A1 FIRE RESISTANT, HIGH FLOW POLY(ARYL ETHER SULFONE) COMPOSITION SOLVAY ADVANCED POLYMERS, L.L.C. (US) 2009-11-12 WO disclosed
US-6974658-B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS KABUSHIKI KAISHA TOSHIBA (JP) 2005-12-13 US disclosed
US-20030235781-A1 High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components KABUSHIKI KAISHA TOSHIBA (JP) 2003-12-25 US disclosed