SCHEMBL10706145

SCHEMBL10706145

CC(Cc1ccccc1O)c1ccc(O)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 4/20 0.58
▸ ESR2 Q92731 3/20 0.58
▸ KEAP1 Q14145 1/20 0.48
▸ HSPA5 P11021 1/20 0.43
▸ PDCD1 Q15116 1/20 0.43
▸ CD274 Q9NZQ7 1/20 0.43
▸ CYP2D6 P10635 5/20 0.43
▸ SLC6A2 P23975 5/20 0.43
▸ SLC6A3 Q01959 5/20 0.43
▸ CYP3A4 P08684 4/20 0.43
▸ SLC6A4 P31645 4/20 0.43
▸ KCNH2 Q12809 2/20 0.43
▸ MIF P14174 1/20 0.42
▸ POLB P06746 1/20 0.41
▸ MAPK1 P28482 1/20 0.41
▸ IDO1 P14902 2/20 0.41
▸ TSHR P16473 2/20 0.41
▸ LMNA P02545 1/20 0.39
▸ CYP1A2 P05177 1/20 0.39
▸ PGR P06401 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28601374 0.94 ESR1 (0.48) ESR1ESR2HSPA5CYP2D6SLC6A2
SCHEMBL30394315 0.90 ESR1 (0.64) ESR1ESR2PDCD1CD274CYP2D6
SCHEMBL2472270 0.90 ESR1 (0.64) ESR1ESR2PDCD1CD274CYP2D6
SCHEMBL25215353 0.89 SLC6A2 (0.47) ESR1ESR2HSPA5CYP2D6SLC6A2
SCHEMBL1952363 0.89 SLC6A2 (0.47) ESR1ESR2HSPA5CYP2D6SLC6A2
SCHEMBL8829120 0.82 ESR1 (0.55) ESR1ESR2PDCD1CD274CYP2D6
SCHEMBL10335147 0.82 CYP3A4 (0.44) ESR1CYP2D6SLC6A2SLC6A3CYP3A4
SCHEMBL19902021 0.81 ESR1 (0.58) ESR1ESR2PDCD1CD274CYP2D6
SCHEMBL7164202 0.81 HDAC4 (0.49) HSPA5CYP2D6SLC6A2SLC6A3CYP3A4
SCHEMBL5159407 0.81 ESR1 (0.58) ESR1ESR2PDCD1CD274CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1366542-A Polycarbonate resin for optical disk substrate and optical disk substrate IDEMITSU PETROCHEMICAL CO (JP) 2002-08-28 — — CN claimed
EP-0155469-B1 EPOXY RESIN COMPOSITION AND A PROCESS FOR PREPARING LAMINATES THEREFROM THE DOW CHEMICAL COMPANY (US) 1988-07-20 — — EP claimed
CN-106029734-A Polycarbonate resin and polycarbonate resin composition 出光兴产株式会社 2016-10-12 — — CN disclosed
CN-101358026-B Polycarbonate resin for optical disk substrate and optical disk substrate IDEMITSU PETROCHEMICAL CO 2011-07-06 — — CN disclosed
CN-101358025-B Polycarbonate resin for optical disk substrate and optical disk substrate IDEMITSU PETROCHEMICAL CO 2011-03-30 — — CN disclosed
CN-100457826-C Polycarbonate resin for optical disk substrate and optical disk substrate IDEMITSU PETROCHEMICAL CO (JP) 2009-02-04 — — CN disclosed
CN-101358025-A Polycarbonate resin for optical disk substrate and optical disk substrate IDEMITSU PETROCHEMICAL CO (JP) 2009-02-04 — — CN disclosed
CN-101358026-A Polycarbonate resin for optical disk substrate and optical disk substrate IDEMITSU PETROCHEMICAL CO (JP) 2009-02-04 — — CN disclosed
CN-1113076-C Polyorganosiloxane simultaneously contg sulfoacid group and alkyl group with mercapto MITSUI CHEMICALS INC (JP) 2003-07-02 — — CN disclosed
CN-1366542-A Polycarbonate resin for optical disk substrate and optical disk substrate IDEMITSU PETROCHEMICAL CO (JP) 2002-08-28 — — CN disclosed
CN-1317508-A Polyorganosiloxanes catalyst MITSUI CHEMICALS INC (JP) 2001-10-17 — — CN disclosed
CN-1071300-C Process for preparing bisphenol A MITSUI TOATSU CHEMICALS (JP) 2001-09-19 — — CN disclosed
CN-1283647-A Polyorganosiloxane simultaneously contg sulfoacid group and alkyl group with mercapto MITSUI CHEMICAL IND CO LTD (JP) 2001-02-14 — — CN disclosed
CN-1119637-A Process for preparing bisphenol a MITSUI TOATSU CHEMICALS (JP) 1996-04-03 — — CN disclosed
US-4310654-A THERMOPLASTIC HYDROLYTICALLY STABLE GENERAL ELECTRIC COMPANY (US) 1982-01-12 — — US disclosed
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