⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12293966 | 0.90 | TSHR (0.31) | — | |
| SCHEMBL16543370 | 0.89 | — | — | |
| SCHEMBL19862665 | 0.86 | — | — | |
| SCHEMBL28713506 | 0.84 | TSHR (0.31) | — | |
| SCHEMBL4108243 | 0.84 | TSHR (0.32) | — | |
| SCHEMBL16543388 | 0.84 | — | — | |
| SCHEMBL16543440 | 0.83 | CYP17A1 (0.34) | — | |
| SCHEMBL737596 | 0.82 | ALDH1A1 (0.35) | — | |
| SCHEMBL12153603 | 0.81 | GAA (0.33) | — | |
| SCHEMBL15043156 | 0.81 | CYP17A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2275464-B1 | Method for producing a polymer | NIPPON SODA CO (JP) | 2014-04-23 | — | — | EP | disclosed |
| EP-1892255-B1 | ACRYLIC ACID POLYMER | NIPPON SODA CO (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-8211615-B2 | Copolymer for immersion lithography and compositions | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-20110046333-A1 | ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| EP-2275464-A1 | Method for producing a polymer | NIPPON SODA CO., LTD. (JP) | 2011-01-19 | — | — | EP | disclosed |
| US-7847045-B2 | Acrylic acid-based polymer and method of producing the same | NIPPON SODA CO., LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| US-20100047710-A1 | COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-02-25 | — | — | US | disclosed |
| US-7638257-B2 | contains acid generator; post exposure baking | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-12-29 | — | — | US | disclosed |
| US-7638257-B2 | contains acid generator; post exposure baking | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090263741-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20090263741-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| EP-1892255-A1 | ACRYLIC ACID POLYMER AND METHOD FOR PRODUCING SAME | NIPPON SODA CO., LTD. (JP) | 2008-02-27 | — | — | EP | disclosed |