Phosphoric Acid

Phosphoric Acid

SCHEMBL1074271

C=CCOCC(C)O.O=P(O)(O)O

nearest known ligand 0.47

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.47
CA2 P00918 4/20 0.47
CA7 P43166 3/20 0.47
CA9 Q16790 3/20 0.39
HSD17B10 Q99714 1/20 0.39
TDP1 Q9NUW8 1/20 0.35
CA4 P22748 2/20 0.33
TSHR P16473 1/20 0.31
ALDH1A1 P00352 1/20 0.31
MAPK1 P28482 1/20 0.31
CYP2D6 P10635 1/20 0.31
MEN1 O00255 1/20 0.31
POLB P06746 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28911561 0.92 CA1 (0.44) CA1CA2CA7CA9HSD17B10
SCHEMBL28911609 0.92 CA1 (0.44) CA1CA2CA7CA9HSD17B10
SCHEMBL3263850 0.89
SCHEMBL221149 0.89
SCHEMBL32668689 0.89
SCHEMBL27352235 0.89 CA1 (0.56) CA1CA2CA7CA9HSD17B10
SCHEMBL29384786 0.87
SCHEMBL1123582 0.87
Sulfuric Acid SCHEMBL4507170 0.84 CA1 (0.47) CA1CA2CA7CA9HSD17B10
Phosphonic Acid SCHEMBL9639269 0.84 CA1 (0.47) CA1CA2CA7CA9HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 154 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0857583-B1 THERMAL TRANSFER INK RIBBON SONY CHEMICALS CORP (JP) 2002-12-11 EP claimed
US-6099967-A COMPRISING A BASE MATERIAL AND FORMED ON ONE SIDE THEREOF AN INK LAYER COMPRISING A COLORANT AND A BINDER CONTAINING A VINYL CHLORIDE RESIN, WHEREIN THE VINYL CHLORIDE RESIN HAS AT LEAST ONE OF AN EPOXY GROUP AND A STRONG-ACID SALT GROUP SONY CHEMICALS CORPORATION (JP) 2000-08-08 US claimed
EP-0857583-A1 THERMAL TRANSFER INK RIBBON Sony Chemicals Corporation (JP) 1998-08-12 EP claimed
WO-2024117198-A1 BINDER COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY ELECTRODE, SLURRY COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY ELECTRODE, NON-AQUEOUS SECONDARY BATTERY ELECTRODE, AND NON-AQUEOUS SECONDARY BATTERY 日本ゼオン株式会社 2024-06-06 WO disclosed
CN-117501530-A Composition for functional layer of nonaqueous secondary battery, functional layer for nonaqueous secondary battery, spacer for nonaqueous secondary battery, and nonaqueous secondary battery 日本瑞翁株式会社 2024-02-02 CN disclosed
WO-2024024912-A1 BINDER COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY ELECTRODES, SLURRY COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY ELECTRODES, ELECTRODE FOR NONAQUEOUS SECONDARY BATTERIES, AND NONAQUEOUS SECONDARY BATTERY 日本ゼオン株式会社 2024-02-01 WO disclosed
WO-2024024913-A1 BINDER COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY ELECTRODE, SLURRY COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY ELECTRODE, ELECTRODE FOR NONAQUEOUS SECONDARY BATTERY, AND NONAQUEOUS SECONDARY BATTERY 日本ゼオン株式会社 2024-02-01 WO disclosed
US-11850772-B2 Laminate production method ZEON CORPORATION (JP) 2023-12-26 US disclosed
US-11827790-B2 Polymer latex and layered product ZEON CORPORATION (JP) 2023-11-28 US disclosed
EP-3739000-B1 LATEX COMPOSITION ZEON CORP (JP) 2023-11-01 EP disclosed
EP-3323613-B1 DIP-MOLDED ARTICLE AND PROTECTIVE GLOVE ZEON CORP (JP) 2023-08-02 EP disclosed
US-5064720-A Dispersibility, high density KONICA CORPORATION (JP) 1991-11-12 US disclosed
US-5064730-A Vinyl Chloride Interpolymer NIPPON ZEON CO., LTD. (JP) 1991-11-12 US disclosed
US-4983311-A BINDER IS VINYL CHLORIDE COPOLYMER CONTAINING HYDROXYL GROUP CONTAINING UNSATURATED ETHER NIPPON ZEON CO., LTD. (JP) 1991-01-08 US disclosed
EP-0385715-A2 Magnetic recording medium NIPPON ZEON CO., LTD. (JP) 1990-09-05 EP disclosed
EP-0368563-A2 Drilling fluid additives NIPPON SHOKUBAI CO., LTD. (JP) 1990-05-16 EP disclosed
US-4900631-A COPOLYMER OF VINYL CHLORIDE, SULFUR, OR PHOSPHORUS CONTAINING COMPOUND AND HYDROXY CONTAINING COMPOUND NIPPON ZEON CO., LTD. (JP) 1990-02-13 US disclosed
US-4851465-A VINYL CHLORIDE, SULFUR OR PHOSPHORUS ACID UNSATURATED MONOMER, HYDROXY-CONTAINING UNSATURATED MONOMER, MAGNETIC RECORDING MEDIA NIPPON ZEON CO., LTD. (JP) 1989-07-25 US disclosed
US-4707411-A VINYL CHLORIDE POLYMERS NIPPON ZEON CO., LTD. (JP) 1987-11-17 US disclosed
US-4600521-A Electron-beam reactive magnetic coating composition for magnetic recording media NIPPON ZEON CO., LTD. (JP) 1986-07-15 US disclosed