Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.55 |
| ▸ | MEN1 | O00255 | 2/20 | 0.55 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | MAPT | P10636 | 1/20 | 0.55 |
| ▸ | F2 | P00734 | 2/20 | 0.54 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.54 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.54 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 4/20 | 0.46 |
| ▸ | CA2 | P00918 | 4/20 | 0.46 |
| ▸ | CA5A | P35218 | 4/20 | 0.46 |
| ▸ | CA5B | Q9Y2D0 | 4/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | PKM | P14618 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17779170 | 1.00 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL6126355 | 1.00 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL20254178 | 1.00 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL12840944 | 1.00 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL411430 | 1.00 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL15492870 | 1.00 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL27669444 | 0.86 | KMT2A (0.61) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL15681900 | 0.85 | KMT2A (0.56) | KMT2AALDH1A1MEN1LMNAMAPT | |
| Benzidine SCHEMBL29172643 | 0.85 | KMT2A (0.47) | KMT2AALDH1A1MEN1LMNAF2 | |
| SCHEMBL13761872 | 0.83 | KMT2A (0.58) | KMT2AALDH1A1MEN1LMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 648 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118452171-A | Protection device for crops in farmland | 百色学院 | 2024-08-09 | — | — | CN | disclosed |
| US-20240219831-A1 | PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230400769-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230400766-A1 | ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230384674-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230266675-A1 | INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR VERIFYING COMPOSITION | FUJIFILM CORPORATION (JP) | 2023-08-24 | — | — | US | disclosed |
| US-20230259029-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| US-20230236505-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM | SAN-APRO LTD. (JP) | 2023-07-27 | — | — | US | disclosed |
| US-7262211-B2 | Aromatic heterocyclic non-covalent inhibitors of urokinase and blood vessel formation | DENDREON CORPORATION (US) | 2007-08-28 | — | — | US | disclosed |
| EP-1808440-A1 | Non-covalent inhibitors of urokinase and blood vessel formation | Wilex AG (DE) | 2007-07-18 | — | — | EP | disclosed |
| US-7244544-B2 | Oxime derivatives and the use thereof as latent acids | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2007-07-17 | — | — | US | disclosed |
| US-7244544-B2 | Oxime derivatives and the use thereof as latent acids | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2007-07-17 | — | — | US | disclosed |
| EP-1182207-B1 | Non-covalent inhibitors of urokinase and blood vessel formation | DENDREON CORP (US) | 2007-04-18 | — | — | EP | disclosed |
| US-7163982-B2 | Process for preparing fluorine-containing polymer and method of forming fine pattern using same | DAIKI INDUSTRIES, LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7163982-B2 | Process for preparing fluorine-containing polymer and method of forming fine pattern using same | DAIKI INDUSTRIES, LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7157596-B2 | Inhibitors of serine protease activity of matriptase or MTSP1 | DENDREON CORPORATION | 2007-01-02 | — | — | US | disclosed |
| US-7157596-B2 | Inhibitors of serine protease activity of matriptase or MTSP1 | DENDREON CORPORATION | 2007-01-02 | — | — | US | disclosed |
| US-6777431-B2 | ANTICOAGULANTS | CORVAS INTERNATIONAL, INC. | 2004-08-17 | — | — | US | disclosed |