Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.58 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | FABP7 | O15540 | 1/20 | 0.31 |
| ▸ | CAPN1 | P07384 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24239478 | 0.84 | HTT (0.40) | HTT | |
| SCHEMBL19461045 | 0.84 | HTT (0.56) | HTTMEN1ALDH1A1TSHRKMT2A | |
| SCHEMBL805296 | 0.81 | HTT (0.62) | HTTMEN1ALDH1A1TSHRKMT2A | |
| SCHEMBL28371570 | 0.81 | HTT (0.62) | HTTMEN1ALDH1A1TSHRKMT2A | |
| SCHEMBL24239454 | 0.79 | HTT (0.36) | HTT | |
| SCHEMBL765474 | 0.79 | ALDH1A1 (0.42) | HTTMEN1ALDH1A1KMT2AHSD17B10 | |
| SCHEMBL17982679 | 0.79 | HTT (0.67) | HTTMEN1ALDH1A1TSHRKMT2A | |
| SCHEMBL19857483 | 0.79 | HTT (0.60) | HTTMEN1ALDH1A1TSHRKMT2A | |
| SCHEMBL28575211 | 0.77 | HTT (0.32) | HTT | |
| SCHEMBL16160719 | 0.77 | HTT (0.58) | HTTMEN1ALDH1A1TSHRKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230303901-A1 | TWO-PHASE IMMERSION COOLING | NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (HK) | 2023-09-28 | — | — | US | disclosed |
| US-9116437-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |
| US-20120058427-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |