SCHEMBL10784606

SCHEMBL10784606

O=C1CC(=O)C(C(=O)O)=C(C(=O)O)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9578126 0.63
SCHEMBL11430568 0.63 FFAR3 (0.36)
SCHEMBL2296442 0.63
SCHEMBL3172157 0.62
SCHEMBL30770833 0.62
SCHEMBL1268699 0.62 SMN1; SMN2 (0.35)
SCHEMBL25337505 0.62
SCHEMBL25336300 0.62
SCHEMBL28685647 0.60
SCHEMBL28328242 0.59 CYP1A2 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4536465-A CONTAINING CARBOXY, OXY, AROMATIC COMPOUND AND ALDEHYDE OR KETONE WITH A NOVOLAK RESIN KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1985-08-20 US claimed
EP-0083971-B1 PHOTOSENSITIVE COMPOSITION KONICA CORPORATION (JP) 1987-04-01 EP disclosed
US-4536465-A CONTAINING CARBOXY, OXY, AROMATIC COMPOUND AND ALDEHYDE OR KETONE WITH A NOVOLAK RESIN KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1985-08-20 US disclosed
EP-0083971-A2 Photosensitive composition KONICA CORPORATION (JP) 1983-07-20 EP disclosed