Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.65 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 5/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.50 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.48 |
| ▸ | PPARG | P37231 | 6/20 | 0.48 |
| ▸ | PPARD | Q03181 | 6/20 | 0.48 |
| ▸ | PPARA | Q07869 | 6/20 | 0.48 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.48 |
| ▸ | TLR2 | O60603 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | FABP4 | P15090 | 2/20 | 0.48 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.48 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.48 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propionic Acid SCHEMBL29199038 | 1.00 | ALDH1A1 (0.65) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| Propionic Acid SCHEMBL5317229 | 0.95 | ALDH1A1 (0.58) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| Propionic Acid SCHEMBL5314334 | 0.92 | ALDH1A1 (0.55) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| Propionic Acid SCHEMBL5313043 | 0.90 | ALDH1A1 (0.52) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| Myristyl Alcohol SCHEMBL16212814 | 0.89 | TSHR (0.68) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| Myristyl Alcohol SCHEMBL28353736 | 0.89 | TSHR (0.68) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| 1-Pentanol SCHEMBL28864988 | 0.89 | SMN1; SMN2 (0.63) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| Cetyl Alcohol SCHEMBL27622135 | 0.89 | TSHR (0.68) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| Cetostearyl Alcohol SCHEMBL27505872 | 0.89 | TSHR (0.68) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA | |
| Dodecanol SCHEMBL27696059 | 0.89 | TSHR (0.68) | ALDH1A1FFAR3SMN1; SMN2TSHRLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116589914-A | Water-based two-component polyurethane coating suitable for wet spraying and wet construction | 河南省金凤化工有限公司 | 2023-08-15 | — | — | CN | claimed |
| CN-116589914-A | Water-based two-component polyurethane coating suitable for wet spraying and wet construction | 河南省金凤化工有限公司 | 2023-08-15 | — | — | CN | disclosed |
| US-8399304-B2 | Thin film capacitor and method of fabrication thereof | CDA PROCESSING LIMITED LIABILITY COMPANY (US) | 2013-03-19 | — | — | US | disclosed |
| US-20120084955-A1 | THIN FILM CAPACITOR AND METHOD OF FABRICATION THEREOF | E.I.DU PONT DE NEMOURS AND COMPANY (US) | 2012-04-12 | — | — | US | disclosed |
| EP-2425439-A2 | THIN FILM CAPACITOR AND METHOD OF FABRICATION THEREOF | E. I. du Pont de Nemours and Company (US) | 2012-03-07 | — | — | EP | disclosed |
| US-8088658-B2 | Thin film capacitor and method of fabrication thereof | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-03 | — | — | US | disclosed |
| WO-2010129314-A2 | THIN FILM CAPACITOR AND METHOD OF FABRICATION THEREOF | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-11 | — | — | WO | disclosed |
| US-20100270261-A1 | THIN FILM CAPACITOR AND METHOD OF FABRICATION THEREOF | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-10-28 | — | — | US | disclosed |
| CN-101636804-A | Method for the production of a coating of a porous, electrically conductive carrier material with a dielectric | BASF SE | 2010-01-27 | — | — | CN | disclosed |
| US-20090316374-A1 | Reduced Porosity High-K Thin Film Mixed Grains for Thin Film Capacitor Applications | INTEL CORPORATION (US) | 2009-12-24 | — | — | US | disclosed |
| US-7629269-B2 | High-k thin film grain size control | INTEL CORPORATION (US) | 2009-12-08 | — | — | US | disclosed |
| US-20060220177-A1 | Reduced porosity high-k thin film mixed grains for thin film capacitor applications | INTEL CORPORATION | 2006-10-05 | — | — | US | disclosed |
| US-20060220176-A1 | High-k thin film grain size control | INTEL CORPORATION | 2006-10-05 | — | — | US | disclosed |
| US-5039654-A | Applying solutions of organometallic compounds, then repeated roasting to form ceramic film | DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1991-08-13 | — | — | US | disclosed |
| EP-0277020-A2 | Method of preparing a superconductive material | Director-General of the Agency of Industrial Science and Technology (JP) | 1988-08-03 | — | — | EP | disclosed |
| US-4380620-A | ANIONIC POLYMERIZATION CATALYSTS | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1983-04-19 | — | — | US | disclosed |