⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15763881 | 0.95 | TSHR (0.52) | — | |
| Acetic Acid SCHEMBL1626812 | 0.93 | TSHR (0.50) | — | |
| Ether SCHEMBL27717982 | 0.91 | TSHR (0.48) | — | |
| SCHEMBL19514117 | 0.91 | GAA (0.50) | — | |
| SCHEMBL1357249 | 0.89 | TSHR (0.50) | — | |
| SCHEMBL29258053 | 0.88 | TSHR (0.44) | — | |
| SCHEMBL4060095 | 0.87 | TSHR (0.67) | — | |
| SCHEMBL28089954 | 0.86 | TSHR (0.48) | — | |
| SCHEMBL5835607 | 0.86 | TSHR (0.61) | — | |
| SCHEMBL3682553 | 0.84 | TSHR (0.63) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 10348 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| US-20250388765-A1 | Water Washable Ink or Paint | CRAYOLA LLC (US) | 2025-12-25 | — | — | US | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| EP-4615891-A1 | DSA OF LIQUID CRYSTAL BLOCK COPOLYMERS FOR INTEGRATED CIRCUIT PATTERNING | Merck Patent GmbH (DE) | 2025-09-17 | — | — | EP | claimed |
| CN-114995058-B | Resin precursor composition, polyimide resin film containing resin precursor composition and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119781246-A | Photosensitive polyimide resin composition, cured film, and preparation method and application thereof | 吉林奥来德光电材料股份有限公司 | 2025-04-08 | — | — | CN | claimed |
| CN-119620541-A | Preparation and application of bottom anti-reflection coating with high etching rate | 儒芯微电子材料（上海）有限公司 | 2025-03-14 | — | — | CN | claimed |
| US-20250021002-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) | 2025-01-16 | — | — | US | claimed |
| CN-119264321-A | Method for regulating and controlling molecular weight change of electronic grade acrylic resin | 厦门大学 | 2025-01-07 | — | — | CN | claimed |
| CN-112684662-B | Black matrix for liquid crystal display device | 尚健 | 2024-12-13 | — | — | CN | claimed |
| US-6368768-B1 | ACRYLATE ESTER COPOLYMER | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-04-09 | — | — | US | claimed |
| US-6183942-B1 | CAN BE USED IN WASHING AND REMOVING THE UNNECESSARY SPIN-ON-GLASS (SOG) OF AN SOG LAYER AT EDGES AND BACKSIDE ON SEMICONDUCTOR SUBSTRATES | DONGJIN SEMICHEM CO., LTD. (KR) | 2001-02-06 | — | — | US | claimed |
| CN-1271720-A | Organic anti reflection paint and its preparation | HYUNDAI ELECTRONICS IND (KR) | 2000-11-01 | — | — | CN | claimed |
| CN-1271113-A | Diluent composition for removing unnecessary sensitive resin | DONGJIN THEMIKAN CO LTD (KR) | 2000-10-25 | — | — | CN | claimed |
| US-6048659-A | PHOTOSENSITIVITY, ALKALINITY, QUINONEDIAZIDE AND MONOKETONE | JSR CORPORATION (JP) | 2000-04-11 | — | — | US | claimed |
| EP-0907108-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-04-07 | — | — | EP | claimed |
| EP-0408635-B1 | TRANSESTERIFICATION OF ALKOXYESTERS | EASTMAN KODAK CO (US) | 1994-02-23 | — | — | EP | claimed |
| EP-0408635-A1 | TRANSESTERIFICATION OF ALKOXYESTERS. | EASTMAN KODAK CO (US) | 1991-01-23 | — | — | EP | claimed |
| US-4898969-A | Transesterification of alkoxyesters | EASTMAN KODAK COMPANY (US) | 1990-02-06 | — | — | US | claimed |
| WO-1989009762-A1 | TRANSESTERIFICATION OF ALKOXYESTERS | EASTMAN KODAK COMPANY (US) | 1989-10-19 | — | — | WO | claimed |