Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | CA12 | O43570 | 2/20 | 0.40 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | DGKA | P23743 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17909074 | 0.96 | TSHR (0.56) | TSHRALDH1A1LMNASMN1; SMN2MAPT | |
| SCHEMBL17909095 | 0.96 | TSHR (0.56) | TSHRALDH1A1LMNASMN1; SMN2MAPT | |
| SCHEMBL8430649 | 0.93 | TSHR (0.58) | TSHRALDH1A1LMNAKMT2ADGKA | |
| SCHEMBL20210561 | 0.91 | TSHR (0.56) | TSHRALDH1A1LMNAKMT2ADGKA | |
| SCHEMBL15432450 | 0.91 | TSHR (0.56) | TSHRALDH1A1LMNAKMT2ADGKA | |
| SCHEMBL4430084 | 0.88 | TSHR (0.70) | TSHRALDH1A1LMNAMAPTMEN1 | |
| SCHEMBL108174 | 0.86 | — | — | |
| SCHEMBL8430516 | 0.84 | TSHR (0.58) | TSHRALDH1A1LMNAMAPTMEN1 | |
| SCHEMBL10286759 | 0.84 | TSHR (0.58) | TSHRALDH1A1LMNAMAPTKMT2A | |
| SCHEMBL28305335 | 0.84 | TSHR (0.64) | TSHRALDH1A1LMNAMAPTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3683243-B1 | PROCESS OF MANUFACTURE OF CATALYST AND PROPYLENE POLYMER THAT USE THIS OR COPOLYMER FOR PROPYLENE POLYMERIZATION | HANWHA TOTALENERGIES PETROCHEMICAL CO LTD (KR) | 2024-01-24 | — | — | EP | claimed |
| CN-108148153-B | Solid catalyst and method for preparing propylene polymer or copolymer using the same | 韩华道达尔有限公司 | 2021-08-10 | — | — | CN | claimed |
| EP-3683243-A1 | PROCESS OF MANUFACTURE OF CATALYST AND PROPYLENE POLYMER THAT USE THIS OR COPOLYMER FOR PROPYLENE POLYMERIZATION | Hanwha Total Petrochemical Co., Ltd. (KR) | 2020-07-22 | — | — | EP | claimed |
| US-20240310724-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-09-19 | — | — | US | disclosed |
| CN-109559980-B | Method of manufacturing integrated circuit device | 三星电子株式会社 | 2024-02-23 | — | — | CN | disclosed |
| EP-3683243-B1 | PROCESS OF MANUFACTURE OF CATALYST AND PROPYLENE POLYMER THAT USE THIS OR COPOLYMER FOR PROPYLENE POLYMERIZATION | HANWHA TOTALENERGIES PETROCHEMICAL CO LTD (KR) | 2024-01-24 | — | — | EP | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| CN-108148153-B | Solid catalyst and method for preparing propylene polymer or copolymer using the same | 韩华道达尔有限公司 | 2021-08-10 | — | — | CN | disclosed |
| US-10808048-B2 | Process of manufacture of catalyst and propylene polymer that use this or copolymer for propylene polymerization | HANWHA TOTAL PETROCHEMICAL CO., LTD. (KR) | 2020-10-20 | — | — | US | disclosed |
| US-7037929-B1 | 2-amino-thiazole derivatives, process for their preparation, and their use as antitumor agents | PHARMACIA & UPJOHN S.P.A. (IT) | 2006-05-02 | — | — | US | disclosed |
| EP-1124810-B9 | 2-AMINO-THIAZOLE DERIVATIVES, PROCESS FOR THEIR PREPARATION, AND THEIR USE AS ANTITUMOR AGENTS | PHARMACIA ITALIA SPA (IT) | 2005-12-28 | — | — | EP | disclosed |
| EP-1124810-B1 | 2-AMINO-THIAZOLE DERIVATIVES, PROCESS FOR THEIR PREPARATION, AND THEIR USE AS ANTITUMOR AGENTS | PHARMACIA ITALIA SPA (IT) | 2005-05-04 | — | — | EP | disclosed |
| CN-1159625-C | Photosensitive thermosetting composition | 联致科技股份有限公司 | 2004-07-28 | — | — | CN | disclosed |
| CN-1373394-A | Photosensitive thermosetting composition | LIANZHI SCIENCE AND TECHNOLOGY (CN) | 2002-10-09 | — | — | CN | disclosed |
| EP-1124810-A1 | 2-AMINO-THIAZOLE DERIVATIVES, PROCESS FOR THEIR PREPARATION, AND THEIR USE AS ANTITUMOR AGENTS | PHARMACIA & UPJOHN S.p.A. (IT) | 2001-08-22 | — | — | EP | disclosed |
| WO-2000026202-A1 | 2-AMINO-THIAZOLE DERIVATIVES, PROCESS FOR THEIR PREPARATION, AND THEIR USE AS ANTITUMOR AGENTS | PHARMACIA & UPJOHN S.P.A. (IT) | 2000-05-11 | — | — | WO | disclosed |
| EP-0562819-B1 | Resist coating composition | JSR CORP (JP) | 1999-12-01 | — | — | EP | disclosed |
| EP-0562819-A2 | Resist coating composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-09-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | CHRM1, CHRM2, SCO2 | TSHR 636/4885ALDH1A1 836/4885LMNA 4776/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | TSHR 761/4885ALDH1A1 2890/4885LMNA 3320/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.