⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28212881 | 0.96 | — | — | |
| SCHEMBL17048006 | 0.79 | — | — | |
| SCHEMBL17739644 | 0.77 | TSHR (0.35) | — | |
| SCHEMBL3900567 | 0.77 | TSHR (0.35) | — | |
| SCHEMBL11237601 | 0.72 | TSHR (0.38) | — | |
| SCHEMBL3888328 | 0.72 | TSHR (0.38) | — | |
| SCHEMBL15939587 | 0.72 | — | — | |
| SCHEMBL595624 | 0.72 | — | — | |
| SCHEMBL21648916 | 0.72 | — | — | |
| SCHEMBL15091815 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 479 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113767135-A | Process for preparing hydridosilane oligomers | 赢创运营有限公司 | 2021-12-07 | — | — | CN | claimed |
| WO-2018170382-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| US-8822615-B1 | Block copolymer composition and methods relating thereto | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-09-02 | — | — | US | claimed |
| US-8822619-B1 | Directed self assembly copolymer composition and related methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-09-02 | — | — | US | claimed |
| US-20140227448-A1 | Block copolymer composition and methods relating thereto | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-08-14 | — | — | US | claimed |
| US-20140227445-A1 | Directed self assembly copolymer composition and related methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-08-14 | — | — | US | claimed |
| US-20080300364-A1 | Carbon nanotube/polyolefin composite by water-crosslinking reaction and method thereof | FAR EAST UNIVERSITY (TW) | 2008-12-04 | — | — | US | claimed |
| US-11713409-B2 | Substituted saccharides or glycosides and use thereof in a drilling fluid composition | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2023-08-01 | — | — | US | disclosed |
| CN-113767135-A | Process for preparing hydridosilane oligomers | 赢创运营有限公司 | 2021-12-07 | — | — | CN | disclosed |
| CN-109750376-A | Heat-resisting canvas of terylene and preparation method thereof | 江苏恒力化纤股份有限公司 | 2019-05-14 | — | — | CN | disclosed |
| CN-109680358-A | Polyester industrial yarn and preparation method thereof for aerial work safety belt | 江苏恒力化纤股份有限公司 | 2019-04-26 | — | — | CN | disclosed |
| US-10031419-B2 | Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device | FUJIFILM CORPORATION (JP) | 2018-07-24 | — | — | US | disclosed |
| US-20180175299-A1 | ORGANIC THIN FILM TRANSISTOR, METHOD OF MANUFACTURING ORGANIC THIN FILM TRANSISTOR, ORGANIC SEMICONDUCTOR COMPOSITION, ORGANIC SEMICONDUCTOR FILM, AND METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR FILM | FUJIFILM CORPORATION (JP) | 2018-06-21 | — | — | US | disclosed |
| US-20070134588-A1 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070082289-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |
| US-7202014-B2 | Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition | FUJIFILM CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-20070059639-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-15 | — | — | US | disclosed |
| EP-0693502-B1 | Catalyst component for the polymerization of alpha-olefins and a process for preparing alpha-olefin polymers with use of same | MITSUBISHI CHEM CORP (JP) | 1997-11-05 | — | — | EP | disclosed |
| US-5594081-A | METALLOCENES | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-01-14 | — | — | US | disclosed |
| EP-0693502-A1 | Catalyst component for the polymerization of alpha-olefins and a process for preparing alpha-olefin polymers with use of same | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-01-24 | — | — | EP | disclosed |