Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM5 | P41594 | 6/20 | 0.41 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.38 |
| ▸ | APP | P05067 | 1/20 | 0.38 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | HNF4A | P41235 | 1/20 | 0.34 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.34 |
| ▸ | ASIC3 | Q9UHC3 | 1/20 | 0.33 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.33 |
| ▸ | AAK1 | Q2M2I8 | 1/20 | 0.33 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.33 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7038780 | 0.78 | NCOA1 (0.42) | — | |
| SCHEMBL5872097 | 0.78 | APP (0.48) | GRM5FFAR1APPMAPTCYP1A1 | |
| SCHEMBL7035101 | 0.76 | PELI1 (0.36) | CYP1A2CYP1B1 | |
| SCHEMBL28431396 | 0.75 | APP (0.67) | GRM5FFAR1APPMAPTCYP1A2 | |
| SCHEMBL709245 | 0.75 | APP (0.67) | GRM5FFAR1APPMAPTCYP1A2 | |
| SCHEMBL7526751 | 0.74 | GRM5 (0.56) | GRM5APPMAPTHNF4AASIC3 | |
| SCHEMBL15772642 | 0.73 | APP (0.63) | GRM5FFAR1APPMAPTCYP1A2 | |
| Diphenylacetylene SCHEMBL20893441 | 0.73 | APP (0.71) | GRM5FFAR1APPMAPTCYP1A2 | |
| SCHEMBL12760764 | 0.72 | FFAR1 (0.42) | GRM5FFAR1APPMAPTCYP1A1 | |
| SCHEMBL7997661 | 0.72 | GRM5 (0.55) | GRM5APPMAPTHNF4AASIC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0179365-A2 | Process for filling deep dielectric isolation trenches in semiconductor devices | International Business Machines Corporation (US) | 1986-04-30 | — | — | EP | disclosed |