SCHEMBL10889256

SCHEMBL10889256

O=C(/C=C/c1ccccc1)OC=Cc1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.57
LMNA P02545 3/20 0.57
ALDH1A1 P00352 3/20 0.57
HDAC3 O15379 2/20 0.57
HDAC4 P56524 2/20 0.57
HDAC1 Q13547 2/20 0.57
HDAC2 Q92769 2/20 0.57
HDAC8 Q9BY41 2/20 0.57
HDAC6 Q9UBN7 2/20 0.57
PLIN1 O60240 2/20 0.57
RECQL P46063 2/20 0.57
PLIN5 Q00G26 2/20 0.57
ABHD5 Q8WTS1 2/20 0.57
SMN1; SMN2 Q16637 2/20 0.57
TNKS O95271 1/20 0.57
HCAR2 Q8TDS4 1/20 0.57
HDAC7 Q8WUI4 1/20 0.57
HDAC10 Q969S8 1/20 0.57
HDAC11 Q96DB2 1/20 0.57
TNKS2 Q9H2K2 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28535411 1.00 MAPT (0.57) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL3865750 0.94 LMNA (0.54) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL3868562 0.94 LMNA (0.54) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL331953 0.94 LMNA (0.54) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL3865754 0.94 LMNA (0.54) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL3865743 0.94 LMNA (0.54) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL10404245 0.92 LMNA (0.52) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL28159116 0.89 HCAR2 (0.59) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL2438057 0.87 GLA (0.53) MAPTLMNAALDH1A1HDAC3HDAC4
SCHEMBL2438055 0.87 GLA (0.53) MAPTLMNAALDH1A1HDAC3HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4591544-A Metal image forming materials with light sensitive resin layer and oblique angle deposited metal underlayer KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1986-05-27 US disclosed
US-4411983-A REMOVAL OF NON-IMAGE AREA WITH WATER MISCIBILITY ORGANIC SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 1983-10-25 US disclosed
EP-0082588-A2 Photolithographic elements for the production of metal images KONICA CORPORATION (JP) 1983-06-29 EP disclosed
US-4083725-A CINNAMIC ACID PHOTOSENSITIVE RESIN AND A HALOGEN SUBSTITUTED BENZANTHRONE SENSITIZER MITSUBISHI CHEMICAL INDUSTRIES LTD. (JA) 1978-04-11 US disclosed
US-4063953-A POLYETHERS, POLYEPICHLOROHYDRIN, VINYL CINNAMATES MITSUBISHI CHEMICAL INDUSTRIES, LTD. (JA) 1977-12-20 US disclosed