Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 5/20 | 0.52 |
| ▸ | GRIN3B | O60391 | 5/20 | 0.52 |
| ▸ | GRIN1 | Q05586 | 5/20 | 0.52 |
| ▸ | GRIN2A | Q12879 | 5/20 | 0.52 |
| ▸ | GRIN2B | Q13224 | 5/20 | 0.52 |
| ▸ | GRIN2C | Q14957 | 5/20 | 0.52 |
| ▸ | GRIN3A | Q8TCU5 | 5/20 | 0.52 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | SLC22A2 | O15244 | 2/20 | 0.39 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.39 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.39 |
| ▸ | STAT6 | P42226 | 1/20 | 0.39 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL27617730 | 0.97 | GRIN2D (0.50) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Phosphine SCHEMBL27873092 | 0.97 | GRIN2D (0.50) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL1678727 | 0.81 | GRIN2D (0.40) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Hydrochloric Acid SCHEMBL4950314 | 0.81 | GRIN2D (0.40) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL23269928 | 0.77 | GRIN2D (0.56) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL11150530 | 0.75 | GRIN2D (0.54) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL17347047 | 0.75 | GRIN2D (0.48) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Hydrochloric Acid SCHEMBL11156628 | 0.73 | GRIN2D (0.52) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL1678049 | 0.73 | GRIN2D (0.46) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Hydrochloric Acid SCHEMBL5962394 | 0.71 | GRIN2D (0.39) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | disclosed |
| US-20250068079-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2025-02-27 | — | — | US | disclosed |
| CN-119173819-A | Bio-based solvent for negative imaging | 菲利普·德内·于斯塔德 | 2024-12-20 | — | — | CN | disclosed |
| WO-2024107979-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2024-05-23 | — | — | WO | disclosed |
| EP-2997075-B1 | NOVEL POLYMER AND THERMOSETTING COMPOSITION CONTAINING SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2021-12-15 | — | — | EP | disclosed |
| US-10604628-B2 | Polymer and thermosetting composition containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2020-03-31 | — | — | US | disclosed |
| EP-2387735-B1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-03-13 | — | — | EP | disclosed |
| CN-105408399-B | Novel polymers and thermosetting compositions containing same | 富士胶片电子材料美国有限公司 | 2019-01-01 | — | — | CN | disclosed |
| US-20170260330-A1 | Novel Polymer and Thermosetting Composition Containing Same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2017-09-14 | — | — | US | disclosed |
| US-9695284-B2 | Polymer and thermosetting composition containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2017-07-04 | — | — | US | disclosed |
| WO-2008103776-A2 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-28 | — | — | WO | disclosed |
| US-20080199805-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| US-20080199814-A1 | Device manufacturing process utilizing a double patterning process | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| WO-2008098189-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-14 | — | — | WO | disclosed |
| WO-2008070060-A2 | DEVICE MANUFACTURING PROCESS UTILIZING A DOUBLE PATTERING PROCESS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-06-12 | — | — | WO | disclosed |
| US-20060270742-A1 | Compositions and methods for the treatment of neurodegenerative diseases | COMBINATORX, INC. | 2006-11-30 | — | — | US | disclosed |
| US-7022456-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| US-20040048190-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-11 | — | — | US | disclosed |
| US-5395895-A | Ethylene-maleic anhydride copolymer with polyhydric alcohol and catalysts | SHOWA DENKO K.K. (JP) | 1995-03-07 | — | — | US | disclosed |
| EP-0565734-A1 | RESIN COMPOSITION AND MOLDING PRODUCED THEREFROM | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1993-10-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170260330-A1 | Novel Polymer and Thermosetting Composition Containing Same | INO80C, INCENP, PUF60 | GRIN2D 4798/4885GRIN3B 4591/4885GRIN1 4323/4885 |
| US-20060270742-A1 | Compositions and methods for the treatment of neurodegenerative diseases | PSEN2, PSEN1, HTT | GRIN2D 320/4885GRIN3B 110/4885GRIN1 221/4885 |
| US-10604628-B2 | Polymer and thermosetting composition containing same | PARG, INO80C, INCENP | GRIN2D 4797/4885GRIN3B 4546/4885GRIN1 4367/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.