Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C3 | P42330 | 1/20 | 0.53 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | ACMSD | Q8TDX5 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | GLA | P06280 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.42 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | BLM | P54132 | 1/20 | 0.42 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1088972 | 1.00 | AKR1C3 (0.53) | AKR1C3HAO1KMT2AACMSDKDM4E | |
| SCHEMBL1088970 | 1.00 | AKR1C3 (0.53) | AKR1C3HAO1KMT2AACMSDKDM4E | |
| SCHEMBL1089451 | 1.00 | AKR1C3 (0.53) | AKR1C3HAO1KMT2AACMSDKDM4E | |
| SCHEMBL1088772 | 0.98 | AKR1C3 (0.55) | AKR1C3HAO1KMT2AACMSDKDM4E | |
| SCHEMBL1088771 | 0.98 | AKR1C3 (0.55) | AKR1C3HAO1KMT2AACMSDKDM4E | |
| SCHEMBL4797936 | 0.86 | AKR1C3 (0.51) | AKR1C3HAO1KMT2AGLAHTT | |
| SCHEMBL1089129 | 0.86 | AKR1C3 (0.51) | AKR1C3HAO1KMT2AKDM4EGLA | |
| SCHEMBL1088631 | 0.86 | AKR1C3 (0.51) | AKR1C3HAO1KMT2AHTTSMN1; SMN2 | |
| SCHEMBL4809029 | 0.84 | AKR1C3 (0.50) | AKR1C3KMT2ASMN1; SMN2MEN1NPC1 | |
| SCHEMBL1089121 | 0.84 | AKR1C3 (0.46) | AKR1C3HAO1KMT2AKDM4ESMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3517571-A1 | (METH)ACRYLIC COPOLYMER, RESIN COMPOSITION, MOLDED BODY OF SAME, AND METHOD FOR PRODUCING MOLDED BODY | Mitsubishi Gas Chemical Company, Inc. (JP) | 2019-07-31 | — | — | EP | disclosed |
| US-9138383-B1 | Nanogel materials and methods of use thereof | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2015-09-22 | — | — | US | disclosed |
| US-8765310-B2 | Nonaqueous electrolytic solution and nonaqueous electrolyte secondary battery using the same | HITACHI, LTD. (JP) | 2014-07-01 | — | — | US | disclosed |
| US-8535872-B2 | Thermally cured underlayer for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2013-09-17 | — | — | US | disclosed |
| US-20120178871-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | DE BINOD B (US) | 2012-07-12 | — | — | US | disclosed |
| US-8153346-B2 | Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2012-04-10 | — | — | US | disclosed |
| US-20110269026-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING THE SAME | HITACHI, LTD. (JP) | 2011-11-03 | — | — | US | disclosed |
| WO-2008103776-A2 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-28 | — | — | WO | disclosed |
| US-20080206676-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS, U.S.A, INC | 2008-08-28 | — | — | US | disclosed |
| US-7416821-B2 | Thermally cured undercoat for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2008-08-26 | — | — | US | disclosed |
| EP-1743363-A2 | THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION | FujiFilm Electronic Materials USA, Inc. (US) | 2007-01-17 | — | — | EP | disclosed |
| US-20050238997-A1 | Thermally cured undercoat for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. | 2005-10-27 | — | — | US | disclosed |
| WO-2005089150-A2 | THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS USA INC. (US) | 2005-09-29 | — | — | WO | disclosed |