SCHEMBL1089787

SCHEMBL1089787

NC1=C2CCC(C1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL8350374 0.97
SCHEMBL31159465 0.76
SCHEMBL10583341 0.69
SCHEMBL9625110 0.67
SCHEMBL9812126 0.67
SCHEMBL597830 0.67
SCHEMBL2005262 0.67
SCHEMBL8629971 0.67
SCHEMBL165724 0.67
SCHEMBL512357 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0092647-B1 NEW ACTIVE COMPOUNDS IN THE TREATMENT OF ULCERS AND SKIN ALLERGY SYMPTOMS MAGIS FARMACEUTICI S.p.A. (IT) 1987-01-14 EP claimed
EP-0092647-A1 New active compounds in the treatment of ulcers and skin allergy symptoms MAGIS FARMACEUTICI S.p.A. (IT) 1983-11-02 EP claimed
WO-2025106697-A1 BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING HUSTAD PHILLIP DENE (US) 2025-05-22 WO disclosed
US-20250068079-A1 BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT HUSTAD PHILLIP DENE (US) 2025-02-27 US disclosed
CN-119173819-A Bio-based solvent for negative imaging 菲利普·德内·于斯塔德 2024-12-20 CN disclosed
WO-2024107979-A1 BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT HUSTAD PHILLIP DENE (US) 2024-05-23 WO disclosed
CN-110577564-B Polypeptides and methods 英国研究与创新署 2024-02-13 CN disclosed
CN-108410827-B Method for integrating amino acids comprising BCN groups into polypeptides 英国研究与创新署 2023-05-09 CN disclosed
CN-112745431-B Cycloolefin copolymer and preparation method thereof 广东华锦达新材科技有限公司 2023-04-21 CN disclosed
CN-115916799-A Methods, systems, and kits for polypeptide processing and analysis 德克萨斯大学系统董事会 2023-04-04 CN disclosed
CN-114230792-A Positive photosensitive polyimide resin, resin composition, and preparation method and application thereof 明士(北京)新材料开发有限公司 2022-03-25 CN disclosed
CN-1462290-A Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL CO (JP) 2003-12-17 CN disclosed
EP-0760362-B1 DIAMINOMETHYLIDENE DERIVATIVE NISSHIN SEIFUN GROUP INC (JP) 2002-08-14 EP disclosed
US-5981139-A INCLUDE A PHOTOSENSITIVE ACID GENERATOR, A POLYHYDROXY-FUNCTIONAL RESIN COMPONENT AND AN ALIPHATIC AMINE; PROVIDE ACCURATE PHOTORESIST PATTERN SHAPE SONY CORPORATION (JP) 1999-11-09 US disclosed
CN-1034331-C Amines and their use MITSUI PHARMACEUTICALS LTD (JP) 1997-03-26 CN disclosed
CN-1043319-A New amine and uses thereof MITSUI PHARMACEUTICALS (JP) 1990-06-27 CN disclosed
EP-0092647-B1 NEW ACTIVE COMPOUNDS IN THE TREATMENT OF ULCERS AND SKIN ALLERGY SYMPTOMS MAGIS FARMACEUTICI S.p.A. (IT) 1987-01-14 EP disclosed
US-4613596-A ANTAGONISTS FOR HISTAMINE H2 RECEPTORS, ANTIULCER, SKIN DISORDERS MAGIS FARMACEUTRICI S.R.L. (IT) 1986-09-23 US disclosed
EP-0092647-A1 New active compounds in the treatment of ulcers and skin allergy symptoms MAGIS FARMACEUTICI S.p.A. (IT) 1983-11-02 EP disclosed
EP-0092647-A1 New active compounds in the treatment of ulcers and skin allergy symptoms MAGIS FARMACEUTICI S.p.A. (IT) 1983-11-02 EP disclosed