SCHEMBL2005262

SCHEMBL2005262

[SiH3]C1=C2CCC(C1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10583341 0.69
SCHEMBL512357 0.67
SCHEMBL597830 0.67
SCHEMBL9625110 0.67
SCHEMBL9812126 0.67
SCHEMBL165724 0.67
SCHEMBL1089787 0.67
SCHEMBL8629971 0.67
Hydrochloric Acid SCHEMBL8350374 0.65
Bromide SCHEMBL6350033 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112745431-B Cycloolefin copolymer and preparation method thereof 广东华锦达新材科技有限公司 2023-04-21 CN claimed
CN-112745431-A Cycloolefin copolymer and preparation method thereof 广东新华粤石化集团股份公司 2021-05-04 CN claimed
US-12403082-B2 Cosmetic compositions with improved wear and transfer resistance L'OREAL (FR) 2025-09-02 US disclosed
US-20230265222-A1 OLEFIN/SILOXANE INTERPOLYMERS AND OLEFIN/CYCLIC SILANE INTERPOLYMERS DOW GLOBAL TECHNOLOGIES LLC (US) 2023-08-24 US disclosed
EP-2943826-B1 LAYERS OR THREE-DIMENSIONAL SHAPED BODIES HAVING TWO REGIONS OF DIFFERENT PRIMARY AND/OR SECONDARY STRUCTURE, METHOD FOR PRODUCTION THEREOF AND MATERIALS FOR CONDUCTING THIS METHOD FRAUNHOFER GES FORSCHUNG (DE) 2023-08-02 EP disclosed
US-20230190628-A1 SKIN TREATMENT METHOD KAO CORPORATION (JP) 2023-06-22 US disclosed
US-20230181449-A1 COSMETIC COMPOSITIONS WITH IMPROVED WEAR AND TRANSFER RESISTANCE L'ORÉAL (FR) 2023-06-15 US disclosed
US-20230149272-A1 TOPICAL SKIN PREPARATION COMPOSITION KAO CORPORATION (JP) 2023-05-18 US disclosed
EP-4172247-A1 OLEFIN/SILOXANE INTERPOLYMERS AND OLEFIN/CYCLIC SILANE INTERPOLYMERS Dow Global Technologies LLC (US) 2023-05-03 EP disclosed
US-20230064727-A1 COMPOSITION FOR SKIN EXTERNAL APPLICATION KAO CORPORATION (JP) 2023-03-02 US disclosed
US-20230051587-A1 COMPOSITION FOR EXTERNAL PREPARATION FOR SKIN KAO CORPORATION (JP) 2023-02-16 US disclosed
JP-2003252881-A SILYLNORBORNENE, SILYLTETRACYCLODECENE, METHOD FOR PRODUCING THEM AND USE OF THEM MITSUI CHEMICALS INC 2003-09-10 JP disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
EP-0906588-B1 PHOTODEFINABLE DIELECTRIC COMPOSITIONS GOODRICH CO B F (US) 2002-03-27 EP disclosed
US-6232417-B1 USING COORDINATION CATALYST THE B. F. GOODRICH COMPANY 2001-05-15 US disclosed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
EP-0906588-A1 PHOTODEFINABLE DIELECTRIC COMPOSITIONS THE B.F. GOODRICH COMPANY (US) 1999-04-07 EP disclosed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed
WO-1998020394-A1 PHOTODEFINABLE DIELECTRIC COMPOSITIONS THE B.F. GOODRICH COMPANY (US) 1998-05-14 WO disclosed
US-4028483-A EPDM interpolymers formed with unsaturated organosilanes COPOLYMER RUBBER & CHEMICAL CORPORATION (US) 1977-06-07 US disclosed