SCHEMBL10898409

SCHEMBL10898409

O=C(CS)OCCOC(=O)CS.[NaH]

nearest known ligand 0.48

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.48
HSD17B10 Q99714 1/20 0.48
DGKA P23743 1/20 0.37
ADRA2A P08913 1/20 0.35
ADRA1A P35348 1/20 0.35
TDP1 Q9NUW8 1/20 0.34
MAPT P10636 1/20 0.33
BLM P54132 1/20 0.33
NAAA Q02083 1/20 0.32
CYP2C19 P33261 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL59459 0.97 TSHR (0.50) TSHRHSD17B10DGKAADRA2AADRA1A
SCHEMBL11224122 0.94 TSHR (0.48) TSHRHSD17B10DGKAADRA2AADRA1A
Ethylene SCHEMBL812649 0.91 TSHR (0.46) TSHRHSD17B10DGKAADRA2AADRA1A
Cyclopropane SCHEMBL98406 0.88 TSHR (0.43) TSHRHSD17B10DGKAADRA2AADRA1A
SCHEMBL98638 0.88 TSHR (0.43) TSHRHSD17B10DGKAADRA2AADRA1A
SCHEMBL11357980 0.88 TSHR (0.43) TSHRHSD17B10DGKAADRA2AADRA1A
SCHEMBL13864201 0.88 TSHR (0.43) TSHRHSD17B10DGKAADRA2AADRA1A
Ethylene Glycol SCHEMBL1468277 0.88 TSHR (0.43) TSHRHSD17B10DGKAADRA2AADRA1A
SCHEMBL97649 0.88 TSHR (0.43) TSHRHSD17B10DGKAADRA2AADRA1A
Cyclohexane SCHEMBL8420400 0.88 TSHR (0.43) TSHRHSD17B10DGKAADRA2AADRA1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4618570-A CHLORO-TRIAZINE-TYPE HARDENER, CAYANINE DYE HAVING CYCLOHEXENE RING AND ANTHROAQUINONE AS SENSITIZERS; FOR PRINGTING KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1986-10-21 US disclosed
US-4362807-A SUBBLING LAYER ADHERES MASKING LAYER TO SILVER HALIDE EMULSION LAYER FUJI PHOTO FILM CO., LTD. (JP) 1982-12-07 US disclosed
US-4336316-A PHOTOSENSITIVE MASK FROM THE THERMAL DECOMPOSITION OF BINDER; SILVER HALIDE EMULSIONS; HEAT RESISTANCE; CONTRAST FUJI PHOTO FILM CO., LTD. (JP) 1982-06-22 US disclosed
US-4297436-A ETCHING HYDROPHILIC METAL LAYER TO EXPOSE AN OLEOPHILIC METAL LAYER BELOW FUJI PHOTO FILM CO., LTD. (JP) 1981-10-27 US disclosed
US-4207105-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 1980-06-10 US disclosed
US-4113486-A METHOD FOR PRODUCING A PHOTOMASK FUJI PHOTO FILM CO., LTD. (JP) 1978-09-12 US disclosed
US-4110114-A SILVER HALIDE EMULSION, ION BOMBARDMENT FUJI PHOTO FILM CO., LTD. (JP) 1978-08-29 US disclosed
US-4059445-A SILVER HALIDE EMULSION PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-11-22 US disclosed
US-4056395-A Method for producing a relief pattern by ion-etching a photographic support FUJI PHOTO FILM CO., LTD. (JA) 1977-11-01 US disclosed
US-4025345-A Method of preparing bleached phase hologram and a bleaching solution composition therefor FUJI PHOTO FILM CO., LTD. (JA) 1977-05-24 US disclosed
US-3966473-A SILVER HALIDE EMULSION FUJI PHOTO FILM CO., LTD. (JA) 1976-06-29 US disclosed
US-3960560-A SILVER HALIDE EMULSION FUJI PHOTO FILM CO., LTD. (JA) 1976-06-01 US disclosed