SCHEMBL10935152

SCHEMBL10935152

CC1=C(C)C(=O)N(CCCO)C1=O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.54
PKM P14618 1/20 0.54
KMT2A Q03164 5/20 0.53
PABPC1 P11940 2/20 0.53
L3MBTL1 Q9Y468 2/20 0.53
KDM4E B2RXH2 6/20 0.48
MEN1 O00255 4/20 0.48
HTT P42858 3/20 0.48
RECQL P46063 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
RGS12 O14924 1/20 0.48
NPC1 O15118 1/20 0.48
LMNA P02545 1/20 0.48
RAB9A P51151 1/20 0.48
TSHR P16473 4/20 0.44
HSD17B10 Q99714 3/20 0.40
USP2 O75604 2/20 0.40
MAPT P10636 3/20 0.40
MAPK1 P28482 2/20 0.40
POLB P06746 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6427766 0.91 ALDH1A1 (0.55) ALDH1A1PKMKMT2APABPC1L3MBTL1
SCHEMBL1035100 0.85 ALDH1A1 (0.58) ALDH1A1PKMKMT2APABPC1L3MBTL1
SCHEMBL15975535 0.85 ALDH1A1 (0.56) ALDH1A1PKMKMT2APABPC1L3MBTL1
SCHEMBL14377618 0.85 ALDH1A1 (0.56) ALDH1A1PKMKMT2APABPC1L3MBTL1
SCHEMBL240018 0.82 ALDH1A1 (0.54) ALDH1A1PKMKMT2APABPC1L3MBTL1
SCHEMBL15975537 0.82 ALDH1A1 (0.54) ALDH1A1PKMKMT2APABPC1L3MBTL1
SCHEMBL10703043 0.82 ALDH1A1 (0.54) ALDH1A1PKMKMT2APABPC1L3MBTL1
SCHEMBL13417654 0.80 ALDH1A1 (0.48) ALDH1A1PKMKMT2APABPC1L3MBTL1
SCHEMBL10901592 0.79 ALDH1A1 (0.61) ALDH1A1PKMSMN1; SMN2NPC1RAB9A
SCHEMBL11476165 0.78 ALDH1A1 (0.50) ALDH1A1PKMKDM4ESMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0062610-B1 PHOTOPOLYMERISATION PROCESS CIBA-GEIGY AG (CH) 1985-04-24 EP disclosed
US-4416975-A Photopolymerization process employing compounds containing acryloyl groups and maleimide groups CIBA-GEIGY CORPORATION (US) 1983-11-22 US disclosed
EP-0062610-A2 Photopolymerisation process CIBA-GEIGY AG (CH) 1982-10-13 EP disclosed
US-4193927-A USED IN MANUFACTURE OF POLYMERS WHICH CAN BE CROSSLINKED BY LIGHT CIBA-GEIGY CORPORATION (US) 1980-03-18 US disclosed
US-4174326-A Imidyl compounds CIBA-GEIGY CORPORATION (US) 1979-11-13 US disclosed
US-4172836-A Imidyl compounds CIBA-GEIGY CORPORATION (US) 1979-10-30 US disclosed
US-4163097-A POLYETHERS CONTAINING MALEIMIDE GROUPS CIBA-GEIGY CORPORATION (US) 1979-07-31 US disclosed
US-4158731-A PHOTOSENSITIVE POLYAMIDES CONTAINING MALEIMIDE GROUPS CIBA-GEIGY CORPORATION (US) 1979-06-19 US disclosed
US-4158730-A CONTAINING PHOTOSENSITIVE MALEIMIDE GROUPS; PRINTING PLATES, RELIEF IMAGES CIBA-GEIGY CORPORATION (US) 1979-06-19 US disclosed
US-4107174-A POLYMER MONOMERS CIBA-GEIGY CORPORATION (US) 1978-08-15 US disclosed
US-4079041-A CONTAINING PHOTOSENSITIVE MALEIMIDO GROUPS, PHOTOCURABLE CIBA-GEIGY CORPORATION (US) 1978-03-14 US disclosed