Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GSR | P00390 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | ADAM17 | P78536 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | ACP3 | P15309 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.33 |
| ▸ | FBP1 | P09467 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | SRC | P12931 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL376375 | 0.83 | GSR (0.44) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL2028620 | 0.81 | GSR (0.43) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL10403262 | 0.79 | GSR (0.55) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL27521461 | 0.79 | GSR (0.46) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL10692142 | 0.79 | GSR (0.46) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL8582412 | 0.79 | GSR (0.42) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL1831576 | 0.79 | GSR (0.42) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL3125882 | 0.78 | GSR (0.41) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL2184991 | 0.76 | GSR (0.40) | GSRALDH1A1LMNANPC1ADAM17 | |
| SCHEMBL22323630 | 0.76 | GSR (0.43) | GSRALDH1A1LMNAKMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-60198538-A | — | — | None | — | — | JP | disclosed |
| CN-105027328-B | Battery electrode coating composition or dividing plate coating composition, the battery electrode with the film obtained using the coating composition or dividing plate and the battery with the battery electrode or dividing plate | 协立化学产业株式会社 | 2017-10-27 | — | — | CN | disclosed |
| CN-106104753-A | The duplexer of oxygen plasma etch erosion resistant, etchant resist and use etchant resist | DIC株式会社 | 2016-11-09 | — | — | CN | disclosed |
| CN-103262305-B | Surface protective agent composition for battery electrode or separator, battery electrode or separator protected by same, and battery having same | KYORITSU CHEMICAL & CO.,LTD. (JP) | 2015-11-25 | — | — | CN | disclosed |
| CN-105027328-A | Coating film composition for battery electrodes or separators, battery electrode or separator provided with coating film obtained by using same, and battery provided with battery electrode or separator | KYORITSU CHEMICAL CO LTD | 2015-11-04 | — | — | CN | disclosed |
| CN-103262305-A | Surface protective agent composition for battery electrode or separator, battery electrode or separator protected by same, and battery having same | KYORITSU CHEMICAL CO LTD | 2013-08-21 | — | — | CN | disclosed |
| CN-102076734-B | Modified resin composition, method for producing same, and curable resin composition containing same | ASAHI KASEI CHEMICALS CORP (JP) | 2013-02-27 | — | — | CN | disclosed |
| CN-102076734-A | Modified resin composition, method for producing same, and curable resin composition containing same | ASAHI CHEMICAL CORP (JP) | 2011-05-25 | — | — | CN | disclosed |
| CN-101310212-B | Method for producing substrate for liquid crystal display, substrate for liquid crystal display and liquid crystal display | FUJIFILM CORP | 2010-05-19 | — | — | CN | disclosed |
| CN-101310212-A | Method for producing substrate for liquid crystal display, substrate for liquid crystal display and liquid crystal display | FUJIFILM CORP (JP) | 2008-11-19 | — | — | CN | disclosed |
| CN-100358932-C | Photosensitive composition and cured product thereof | ASAHI CHEMICAL CORP (JP) | 2008-01-02 | — | — | CN | disclosed |
| CN-1839169-A | Photosensitive composition and cured product thereof | ASAHI CHEMICAL CORP (JP) | 2006-09-27 | — | — | CN | disclosed |
| JP-S60198538-A | POSITIVE TYPE RESIST MATERIAL | TOSHIBA CORP | 1985-10-08 | — | — | JP | disclosed |