SCHEMBL109745

SCHEMBL109745

O=C(O)c1cccc(C(=O)c2cccc(C(=O)O)c2C(=O)OC(=O)c2c(C(=O)O)cccc2C(=O)c2cccc(C(=O)O)c2C(=O)O)c1C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 4/20 0.46
AKR1C3 P42330 3/20 0.44
CYP3A4 P08684 1/20 0.43
CYP2C9 P11712 1/20 0.43
KMT2A Q03164 1/20 0.43
ALDH1A1 P00352 2/20 0.43
ALOX15 P16050 1/20 0.43
PRNP P04156 1/20 0.42
CDC25A P30304 1/20 0.39
HSD17B10 Q99714 1/20 0.39
ATM Q13315 1/20 0.39
CA12 O43570 2/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
CA7 P43166 2/20 0.39
CA9 Q16790 2/20 0.39
CA14 Q9ULX7 2/20 0.39
POLB P06746 1/20 0.39
NR4A1 P22736 2/20 0.38
TSHR P16473 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4017455 0.94 CDC25B (0.53) CDC25BAKR1C3CYP3A4CYP2C9KMT2A
SCHEMBL29882813 0.88 CDC25B (0.55) CDC25BAKR1C3CYP3A4CYP2C9KMT2A
SCHEMBL147496 0.88 CDC25B (0.55) CDC25BAKR1C3CYP3A4CYP2C9KMT2A
SCHEMBL617135 0.86 ALDH1A1 (0.48) CDC25BAKR1C3ALDH1A1ALOX15HSD17B10
Ammonia Solution, Strong SCHEMBL11271156 0.86 CDC25B (0.53) CDC25BAKR1C3CYP3A4CYP2C9KMT2A
SCHEMBL1271123 0.85 AKR1C3 (0.60) CDC25BAKR1C3CYP2C9ALDH1A1ALOX15
Hydrochloric Acid SCHEMBL9401868 0.84 ALDH1A1 (0.46) CDC25BAKR1C3ALDH1A1ALOX15HSD17B10
SCHEMBL809323 0.84 ALDH1A1 (0.64) CDC25BAKR1C3CYP3A4CYP2C9KMT2A
SCHEMBL247391 0.82 HSD17B10 (0.47) CDC25BAKR1C3CYP2C9ALDH1A1ALOX15
Pyromellitic Acid SCHEMBL1639948 0.82 CDC25B (0.52) CDC25BAKR1C3CYP3A4CYP2C9KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1803 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024120097-A1 POLYIMIDE ELECTROPHORETIC COATING, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF 合肥汉之和新材料科技有限公司 2024-06-13 WO claimed
CN-112724867-B Insulating adhesive film material and preparation method and application thereof 深圳先进技术研究院 2023-01-10 CN claimed
CN-108250677-B Polymer-based composite material containing filler particle three-dimensional network and preparation method thereof 中国科学院深圳先进技术研究院 2022-10-14 CN claimed
CN-114479734-A Insulating adhesive film, preparation method and application thereof 深圳先进电子材料国际创新研究院 2022-05-13 CN claimed
CN-114369437-A High-temperature-resistant insulating adhesive film, preparation method and application thereof 深圳先进电子材料国际创新研究院 2022-04-19 CN claimed
CN-114149750-A Adhesive, heat-curable adhesive tape, and preparation method and use method thereof 苏州赛伍应用技术股份有限公司 2022-03-08 CN claimed
WO-2020014887-A1 PREPARATION METHOD FOR DENDRITIC OR HYPERBRANCHED POLYMER, AND PREPARED POLYMER THEREOF 威海晨源分子新材料有限公司 2020-01-23 WO claimed
EP-2707412-B1 INSULATION FORMULATIONS DOW GLOBAL TECHNOLOGIES LLC (US) 2016-01-06 EP claimed
EP-1923428-B1 POLYESTER RESIN AQUEOUS DISPERSION, COATING FILM OBTAINED FROM SAME, AND PACKAGING BAG USING SUCH COATING FILM UNITIKA LTD (JP) 2011-11-09 EP claimed
EP-1528090-B1 EPOXY RESIN POWDER COATING MATERIAL NIPPON PELNOX CORP (JP) 2007-07-11 EP claimed
US-5436056-A Copolymerizing polyester having hydroxyl end gropus with a polyisocyanate to form polyesterurethane copolymer in presence of titanium catalyst SHOWA HIGHPOLYMER CO., LTD. (JP) 1995-07-25 US claimed
EP-0362649-B1 Radiation-sensitive compositions and their use BASF AG (DE) 1994-03-02 EP claimed
US-5283279-A Polyorganosiloxane graft copolymer emulsion; when cured has sufficient extensibility to follow cracks in underlying surface SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-02-01 US claimed
US-5270431-A Preparation of oligomeric or polymeric radiation-reactive intermediates for solvent-structured layers BASF AKTIENGESELLSCHAFT (DE) 1993-12-14 US claimed
EP-0572682-A1 PROCESS FOR PRODUCING HIGH-MOLECULAR ALIPHATIC POLYESTER, AND FILM SHOWA HIGHPOLYMER CO., LTD. (JP) 1993-12-08 EP claimed
EP-0362644-B1 RADIATION-SENSITIVE COMPOSITIONS AND THEIR USE BASF Aktiengesellschaft (DE) 1993-05-26 EP claimed
US-5145889-A For light-emitting diodes KABUSHIKI KAISHA TOSHIBA (JP) 1992-09-08 US claimed
EP-0303069-B1 PROCESS FOR THE PREPARATION OF OLIGOMERIC OR POLYMERIC RADIATION-REACTIVE PREADDUCTS FOR SOLVENT-STRUCTURED COATINGS BASF Aktiengesellschaft (DE) 1992-06-24 EP claimed
US-4937208-A Catalyst for sol-gel method using metal alkoxide and sol-gel method using the same YAMAMOTO TOHRU (JP) 1990-06-26 US claimed
US-4889876-A ORGANOMETALLIC POLYMER, SILANE COUPLER,AND ORGANIC MONOMER YAMAMOTO TOHRU (JP) 1989-12-26 US claimed