SCHEMBL11036233

SCHEMBL11036233

CCCCCCCCCCCCNC(=O)NCc1ccc(C)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.61
L3MBTL1 Q9Y468 1/20 0.60
EPHX1 P07099 8/20 0.59
HPGD P15428 2/20 0.56
NPC1 O15118 2/20 0.55
ALDH1A1 P00352 3/20 0.52
HTT P42858 1/20 0.51
MEN1 O00255 1/20 0.51
TP53 P04637 1/20 0.51
RAB9A P51151 1/20 0.51
KMT2A Q03164 1/20 0.51
LMNA P02545 1/20 0.51
ALB P02768 1/20 0.51
CYP2C9 P11712 1/20 0.51
TSHR P16473 1/20 0.51
TDP1 Q9NUW8 1/20 0.51
HDAC3 O15379 3/20 0.51
HDAC4 P56524 3/20 0.51
HDAC1 Q13547 3/20 0.51
HDAC7 Q8WUI4 3/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11068603 1.00 SMN1; SMN2 (0.61) SMN1; SMN2L3MBTL1EPHX1HPGDNPC1
SCHEMBL12987178 0.94 SMN1; SMN2 (0.65) SMN1; SMN2L3MBTL1EPHX1HPGDNPC1
SCHEMBL11035964 0.94 EPHX1 (0.68) EPHX1ALDH1A1HTTHDAC3HDAC4
SCHEMBL11034979 0.94 EPHX1 (0.68) EPHX1ALDH1A1HTTHDAC3HDAC4
SCHEMBL11360702 0.89 EPHX1 (0.61) EPHX1ALDH1A1HTTHDAC3HDAC4
SCHEMBL11366053 0.89 EPHX1 (0.61) EPHX1ALDH1A1HTTHDAC3HDAC4
SCHEMBL12980470 0.88 EPHX1 (0.59) EPHX1ALDH1A1HTTHDAC3HDAC4
SCHEMBL7271378 0.88 EPHX1 (0.59) EPHX1ALDH1A1HTTHDAC3HDAC4
SCHEMBL7271278 0.88 EPHX1 (0.59) EPHX1ALDH1A1HTTHDAC3HDAC4
SCHEMBL7270293 0.88 EPHX1 (0.59) EPHX1ALDH1A1HTTHDAC3HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0029566-B1 PROCESS FOR THE PRODUCTION OF A POLYAMIDE BASE RESIN COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1984-04-18 EP disclosed
EP-0029566-A1 Process for the production of a polyamide base resin composition MITSUBISHI KASEI CORPORATION (JP) 1981-06-03 EP disclosed