SCHEMBL1104270

SCHEMBL1104270

CCSCC(O)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5169996 0.87 LMNA (0.36)
SCHEMBL13400537 0.85 TSHR (0.32)
SCHEMBL890790 0.82 LMNA (0.53)
SCHEMBL7576364 0.80
SCHEMBL13694503 0.79 LMNA (0.50)
SCHEMBL1860323 0.79 LMNA (0.50)
SCHEMBL13010661 0.79
SCHEMBL925175 0.77 LMNA (0.47)
SCHEMBL6309184 0.77 LMNA (0.47)
SCHEMBL10470059 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1500978-B1 Photosensitive metal nanoparticle and method of forming conductive pattern using the same SAMSUNG ELECTRONICS CO LTD (KR) 2014-04-23 EP claimed
US-7923110-B2 Metal nanoparticle having a self-assembled monolayer on its surface, and formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-04-12 US claimed
WO-2009156622-A1 ABSORBING SOLUTION CONTAINING A SULPHURATED ORGANIC DEGRADATION INHIBITOR AND METHOD FOR LIMITING THE DEGRADATION OF AN ABSORBING SOLUTION IFP (FR) 2009-12-30 WO claimed
EP-2099551-A2 EXTRACTION MEDIUM USED IN A METHOD FOR CAPTURING CARBON DIOXIDE CONTAINED IN A GASEOUS EFFLUENT IFP (FR) 2009-09-16 EP claimed
US-7473513-B1 Photosensitive metal nanoparticle and method of forming conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-01-06 US claimed
US-20080311513-A1 PHOTOSENSITIVE METAL NANOPARTICLE AND METHOD OF FORMING CONDUCTIVE PATTERN USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-12-18 US claimed
WO-2008068411-A2 EXTRACTION MEDIUM USED IN A METHOD FOR CAPTURING CARBON DIOXIDE CONTAINED IN A GASEOUS EFFLUENT IFP (FR) 2008-06-12 WO claimed
WO-2008068410-A2 ABSORBING SOLUTION USED IN A METHOD FOR CAPTURING CARBON DIOXIDE CONTAINED IN A GASEOUS EFFLUENT IFP (FR) 2008-06-12 WO claimed
US-20080020317-A1 Novel metal nanoparticle and formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-01-24 US claimed
EP-1500978-A2 Photosensitive metal nanoparticle and method of forming conductive pattern using the same Samsung Electronics Co., Ltd. (KR) 2005-01-26 EP claimed
US-20040253536-A1 Photosensitive metal nanoparticle and method of forming conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-12-16 US claimed
EP-0357295-B1 Catalysts for hydrotreating of hydrocarbons and methods of preparing the same SUMITOMO METAL MINING CO (JP) 1996-07-03 EP claimed
US-4992403-A Mixture of water soluble compound of Group 6 and 8 metal and mercaptan compound SUMITOMO METAL MINING COMPANY LIMITED (JP) 1991-02-12 US claimed
EP-0357295-A2 Catalysts for hydrotreating of hydrocarbons and methods of preparing the same SUMITOMO METAL MINING COMPANY LIMITED (JP) 1990-03-07 EP claimed
CN-111032669-B Orthoester compositions for affinity purification of oligonucleotides 安捷伦科技有限公司 2024-03-29 CN disclosed
US-20210140060-A1 TIN ALLOY PLATING SOLUTION MITSUBISHI MATERIALS CORPORATION (JP) 2021-05-13 US disclosed
EP-1500978-B1 Photosensitive metal nanoparticle and method of forming conductive pattern using the same SAMSUNG ELECTRONICS CO LTD (KR) 2014-04-23 EP disclosed
EP-0357295-A2 Catalysts for hydrotreating of hydrocarbons and methods of preparing the same SUMITOMO METAL MINING COMPANY LIMITED (JP) 1990-03-07 EP disclosed
EP-0324109-A2 6-substituted mitomycin analogs UNIVERSITY PATENTS, INC. (US) 1989-07-19 EP disclosed
WO-1989005811-A1 NEW 6-SUBSTITUTED MITOMYCIN ANALOGS UNIVERSITY PATENTS, INC. (US) 1989-06-29 WO disclosed