SCHEMBL110535

SCHEMBL110535

C=C(C(=O)O)C(C)C#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL7744382 0.83
SCHEMBL9255090 0.83 ALDH1A1 (0.52)
SCHEMBL2816279 0.78
Methacrylic Acid SCHEMBL28025604 0.76 ALDH1A1 (0.43)
SCHEMBL27673986 0.75 ALDH1A1 (0.41)
SCHEMBL9494396 0.73
SCHEMBL185750 0.73
SCHEMBL9497647 0.73
SCHEMBL10664849 0.72
Hydrochloric Acid SCHEMBL10640358 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 867 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4655837-A1 POLYMER ELECTROLYTE COMPOSITION Basquevolt, S.A. (ES) 2025-12-03 EP claimed
WO-2024156384-A1 POLYMER ELECTROLYTE COMPOSITION BASQUEVOLT S.A.U (ES) 2024-08-02 WO claimed
EP-3075750-B1 METHOD FOR PREPARING VINYL CHLORIDE-BASED RESIN HANWHA CHEMICAL CORP (KR) 2020-01-08 EP claimed
US-9637580-B2 Method for preparing vinyl chloride-based resin HANWHA CHEMICAL CORPORATION (KR) 2017-05-02 US claimed
US-20160376387-A1 METHOD FOR PREPARING VINYL CHLORIDE-BASED RESIN HANWHA CHEMICAL CORPORATION (KR) 2016-12-29 US claimed
EP-3075750-A1 METHOD FOR PREPARING VINYL CHLORIDE-BASED RESIN Hanwha Chemical Corporation (KR) 2016-10-05 EP claimed
US-8962748-B2 Silicone-acrylic copolymer Henkel US IP LLC (US) 2015-02-24 US claimed
WO-2007018394-A9 HIGHLY ELASTIC POLYVINYL CHLORIDE COMPOSITION AND PRODUCTS PREPARED USING THE SAME LG CHEM, LTD. (KR) 2010-12-02 WO claimed
US-7547735-B1 UV curable compositions HENKEL CORPORATION (US) 2009-06-16 US claimed
WO-2008070030-A1 UV CURABLE COMPOSITION HENKEL CORPORATION (US) 2008-06-12 WO claimed
US-5002975-A High Nitrile Copolymer, Photopolymerizable solvent, Photoinitiator THE STANDARD OIL COMPANY (US) 1991-03-26 US claimed
EP-0169334-B1 CYANOETHYLACRYLATE/ACRYLIC ACID COPOLYMER PPG INDUSTRIES, INC. (US) 1989-01-25 EP claimed
EP-0262786-A2 Pressure-sensitive adhesive film article having high moisture vapor transmission MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-04-06 EP claimed
US-4670350-A PRIMER FOR BONDING METAL-CONTAINING COATINGS TO POLYMER SUBSTRATES PPG INDUSTRIES, INC. (US) 1987-06-02 US claimed
US-4609703-A Cyanoethylacrylate/acrylic acid copolymer PPG INDUSTRIES, INC. (US) 1986-09-02 US claimed
EP-0191244-A1 100 Percent solids solvent borne nitrile photocurable coating compositions and the process for preparing photocurable coating compositions THE STANDARD OIL COMPANY (US) 1986-08-20 EP claimed
EP-0169334-A1 Cyanoethylacrylate/acrylic acid copolymer PPG INDUSTRIES, INC. (US) 1986-01-29 EP claimed
US-4554318-A Cyanoethylacrylate/acrylic acid copolymer PPG INDUSTRIES, INC. (US) 1985-11-19 US claimed
US-4448932-A Polyvinyl chloride modified with butadiene-containing core-shell composite polymers for enhanced impact strength GAF CORPORATION (US) 1984-05-15 US claimed
US-4279984-A Positive resist for high energy radiation MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1981-07-21 US claimed