SCHEMBL11058382

SCHEMBL11058382

CCN(c1ccc(/N=N/c2sc([N+](=O)[O-])cc2[N+](=O)[O-])c(NC(C)=O)c1)C(C)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 3/20 0.40
MAPT P10636 2/20 0.40
KMT2A Q03164 3/20 0.35
POLB P06746 3/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
ALDH1A1 P00352 2/20 0.34
KDM4E B2RXH2 2/20 0.34
GALR2 O43603 1/20 0.34
MITF O75030 1/20 0.34
LMNA P02545 1/20 0.34
HSP90AA1 P07900 1/20 0.34
HPGD P15428 1/20 0.34
XBP1 P17861 1/20 0.34
CCR6 P51684 1/20 0.34
MEN1 O00255 1/20 0.32
HTT P42858 2/20 0.32
PKM P14618 1/20 0.31
KDR P35968 1/20 0.31
ALDH3A1 P30838 1/20 0.30
SLC9A1 P19634 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11919714 0.89 MAPT (0.42) NPSR1MAPTKMT2APOLBSMN1; SMN2
SCHEMBL11320251 0.89 MAPT (0.42) NPSR1MAPTKMT2APOLBSMN1; SMN2
SCHEMBL14198815 0.89 MAPT (0.42) NPSR1MAPTKMT2APOLBSMN1; SMN2
SCHEMBL29383943 0.89 MAPT (0.42) NPSR1MAPTKMT2APOLBSMN1; SMN2
SCHEMBL11058388 0.85 ALDH1A1 (0.39) NPSR1MAPTKMT2APOLBSMN1; SMN2
SCHEMBL11065273 0.84 MAPT (0.35) NPSR1MAPTKMT2APOLBALDH1A1
SCHEMBL1097635 0.79 MAPT (0.37) NPSR1MAPTKMT2APOLBSMN1; SMN2
SCHEMBL18069599 0.79 MAPT (0.42) NPSR1MAPTKMT2APOLBSMN1; SMN2
SCHEMBL1097638 0.79 MAPT (0.37) NPSR1MAPTKMT2APOLBSMN1; SMN2
SCHEMBL11054221 0.78 ALDH1A1 (0.45) NPSR1MAPTKMT2APOLBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4439513-A Color photographic light-sensitive material with naphthol redox dye releaser FUJI PHOTO FILM CO., LTD. (JP) 1984-03-27 US disclosed