Lactic Acid

Lactic Acid

SCHEMBL11059474

CC(O)C(=O)O.N.N.N.N.[Ti]

nearest known ligand 0.85

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CHRM1DRD2DRD3DRD4HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR2APDE3ASIGMAR1

The experimentally established mechanism targets of Lactic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.85
TSHR P16473 1/20 0.44
SLC7A5 Q01650 1/20 0.40
ALDH1A1 P00352 2/20 0.36
LMNA P02545 2/20 0.36
THRB P10828 1/20 0.35
RECQL P46063 1/20 0.35
OR51E2 Q9H255 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lactic Acid SCHEMBL216439 1.00
Lactic Acid SCHEMBL28579995 1.00 TP53 (0.85) TP53TSHRSLC7A5ALDH1A1LMNA
Lactic Acid SCHEMBL316633 1.00
Lactic Acid SCHEMBL28573855 0.96 TP53 (0.79) TP53TSHRSLC7A5OR51E2
Lactic Acid SCHEMBL28433451 0.96 TP53 (0.79) TP53TSHRSLC7A5OR51E2
Lactic Acid SCHEMBL28537067 0.96 TP53 (0.79) TP53TSHRSLC7A5OR51E2
Lactic Acid SCHEMBL27784110 0.96
Lactic Acid SCHEMBL28669832 0.96 TP53 (0.79) TP53TSHRSLC7A5OR51E2
Lactic Acid SCHEMBL22345879 0.96 TP53 (0.79) TP53TSHRSLC7A5OR51E2
Lactic Acid SCHEMBL7637852 0.96 TP53 (0.79) TP53TSHRSLC7A5OR51E2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4444862-A Electrophotographic photosensitive materials having layer of organic metal compound FUJI XEROX CO., LTD. (JP) 1984-04-24 US disclosed