⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trimethylammonium SCHEMBL1302569 | 0.94 | TSHR (0.38) | — | |
| Dimethylamine SCHEMBL1302671 | 0.94 | TSHR (0.38) | — | |
| SCHEMBL6285624 | 0.83 | TSHR (0.42) | — | |
| SCHEMBL19514114 | 0.80 | TSHR (0.51) | — | |
| SCHEMBL865080 | 0.80 | — | — | |
| SCHEMBL7895166 | 0.79 | TSHR (0.47) | — | |
| Trimethylammonium SCHEMBL1302912 | 0.79 | TSHR (0.39) | — | |
| SCHEMBL6530905 | 0.78 | TSHR (0.38) | — | |
| SCHEMBL6386865 | 0.77 | TSHR (0.46) | — | |
| SCHEMBL1653497 | 0.77 | TSHR (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114394953-A | Polymerizable compound, composition, and liquid crystal display device | 烟台显华科技集团股份有限公司 | 2022-04-26 | — | — | CN | claimed |
| CN-114381279-A | Polymerizable compound, composition, and liquid crystal display device | 烟台显华科技集团股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-114381280-A | Negative dielectric anisotropy liquid crystal composition, optical anisotropic medium and liquid crystal display device | 烟台显华科技集团股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-108140885-A | Composition for gel polymer electrolyte and gel polymer electrolyte | 株式会社LG化学 | 2018-06-08 | — | — | CN | claimed |
| CN-107759740-A | A kind of hydrophilic chain extender monomer and nanoemulsions and preparation method containing guanidine hydrochloride | 上海应用技术大学 | 2018-03-06 | — | — | CN | claimed |
| CN-104877072-B | A kind of water-water height of fluorine-containing modification returns row, Low Damage slippery water fracturing fluid system drag reducer | 长江大学 | 2017-03-29 | — | — | CN | claimed |
| CN-105086892-A | High-water resistance formaldehyde-free and environment-friendly wood adhesive and preparation method thereof | XIAMEN NOVELTY ENVIRONMENTAL TECH CO LTD | 2015-11-25 | — | — | CN | claimed |
| EP-0112564-A1 | Plastic optical fiber | MITSUBISHI RAYON CO., LTD. (JP) | 1984-07-04 | — | — | EP | claimed |
| CN-114394953-A | Polymerizable compound, composition, and liquid crystal display device | 烟台显华科技集团股份有限公司 | 2022-04-26 | — | — | CN | disclosed |
| CN-114381279-A | Polymerizable compound, composition, and liquid crystal display device | 烟台显华科技集团股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-108780162-B | Method for manufacturing optical film and mold | 夏普株式会社 | 2019-09-03 | — | — | CN | disclosed |
| CN-108780162-A | Method for manufacturing optical film and mold | 夏普株式会社 | 2018-11-09 | — | — | CN | disclosed |
| US-10121990-B2 | Organic light emitting devices and methods of fabricating the same | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE (KR) | 2018-11-06 | — | — | US | disclosed |
| CN-108700679-A | The manufacturing method and optical component of optical component | 夏普株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-103620459-A | Optical waveguide and method of fabrication the optical waveguide | XYRATEX TECH LTD | 2014-03-05 | — | — | CN | disclosed |
| CN-101080674-B | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP | 2013-09-18 | — | — | CN | disclosed |
| CN-102484141-A | Photo-crosslinking organic thin film transistor insulating layer material | SUMITOMO CHEMICAL CO | 2012-05-30 | — | — | CN | disclosed |
| CN-101003591-B | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL CO | 2011-08-17 | — | — | CN | disclosed |
| CN-101080674-A | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP (JP) | 2007-11-28 | — | — | CN | disclosed |
| CN-101003591-A | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2007-07-25 | — | — | CN | disclosed |