SCHEMBL865080

SCHEMBL865080

C=CC(=O)OC([O])CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL561301 0.84 TSHR (0.45)
SCHEMBL865527 0.83 TSHR (0.44)
SCHEMBL2441939 0.80
SCHEMBL11068883 0.80
SCHEMBL20913255 0.79 TSHR (0.53)
SCHEMBL1138627 0.79 TSHR (0.45)
SCHEMBL7234032 0.78 TSHR (0.48)
SCHEMBL4094094 0.77
SCHEMBL18215276 0.77
SCHEMBL18215270 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024143347-A1 OPTICAL ANISOTROPIC LAYER, LAMINATE, LIGHT GUIDE ELEMENT, AND AR DISPLAY DEVICE 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143339-A1 OPTICAL ANISOTROPIC LAYER, LIGHT GUIDE ELEMENT, AND AR DISPLAY DEVICE 富士フイルム株式会社 2024-07-04 WO disclosed
CN-118027412-A Photo-alignment material 罗利克技术有限公司 2024-05-14 CN disclosed
US-11977290-B2 Liquid crystal diffraction element, optical element, image display unit, head-mounted display, beam steering, and sensor FUJIFILM CORPORATION (JP) 2024-05-07 US disclosed
US-20240045334-A1 EXPOSURE METHOD OF PHOTOALIGNMENT LAYER FUJIFILM CORPORATION (JP) 2024-02-08 US disclosed
US-20240045335-A1 EXPOSURE METHOD OF PHOTOALIGNMENT LAYER FUJIFILM CORPORATION (JP) 2024-02-08 US disclosed
US-20240036343-A1 LIQUID CRYSTAL DIFFRACTION ELEMENT, IMAGE DISPLAY APPARATUS, AND HEAD MOUNTED DISPLAY FUJIFILM CORPORATION (JP) 2024-02-01 US disclosed
US-20230244012-A1 TRANSMISSIVE LIQUID CRYSTAL DIFFRACTION ELEMENT FUJIFILM CORPORATION (JP) 2023-08-03 US disclosed
US-20230229079-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND WIRING STRUCTURE CONTAINING CURED PRODUCT NAMICS CORPORATION (JP) 2023-07-20 US disclosed
US-20230229002-A1 OPTICAL ELEMENT, LIGHT GUIDE ELEMENT, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-07-20 US disclosed
EP-1966119-A1 PHOTOCROSSLINKABLE MATERIALS Rolic AG (CH) 2008-09-10 EP disclosed
EP-1860094-A1 Photocrosslinkable materials Rolic AG (CH) 2007-11-28 EP disclosed
WO-2007071091-A1 PHOTOCROSSLINKABLE MATERIALS ROLIC AG (CH) 2007-06-28 WO disclosed
EP-1264865-B1 Addition-curable silicone composition with improved adhesion and cured silicone product DOW CORNING (US) 2004-05-12 EP disclosed
US-6589445-B2 Irradiating; changing twisting structure FUJI PHOTO FILM CO., LTD. (JP) 2003-07-08 US disclosed
US-6512037-B1 Hydrosilylation addition-curable silicone composition containing a titanium or zirconium compound having at least one aliphatic carbon-carbon multiple bond DOW CORNING CORPORATION 2003-01-28 US disclosed
US-20030013802-A1 SILICONE COMPOSITION AND CURED SILICONE PRODUCT DOW CORNING CORPORATION 2003-01-16 US disclosed
EP-1264865-A1 Addition-curable silicone composition with improved adhesion and cured silicone product Dow Corning Corporation (US) 2002-12-11 EP disclosed
US-20020033479-A1 Light-reaction type optically active compound, light-reaction type chiral agent, liquid crystal composition, liquid crystal color filter, optical film, recording medium, and method of changing twist structure of liquid crystal FUJI PHOTO FILM CO., LTD. 2002-03-21 US disclosed
US-4855282-A Recording material and method for producing the same FUJI PHOTO FILM CO., LTD. (JP) 1989-08-08 US disclosed