Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.62 |
| ▸ | THRB | P10828 | 1/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | APEX1 | P27695 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | THPO | P40225 | 1/20 | 0.43 |
| ▸ | MTOR | P42345 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | MAOB | P27338 | 2/20 | 0.41 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.40 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.40 |
| ▸ | CHRM2 | P08172 | 4/20 | 0.38 |
| ▸ | CHRM4 | P08173 | 4/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 4/20 | 0.38 |
| ▸ | CHRM3 | P20309 | 4/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL500171 | 0.98 | TSHR (0.66) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL109797 | 0.98 | TSHR (0.66) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL499772 | 0.98 | TSHR (0.66) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL499656 | 0.98 | TSHR (0.66) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL499467 | 0.98 | TSHR (0.66) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL10951222 | 0.98 | TSHR (0.66) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL346151 | 0.95 | TSHR (0.59) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL27889743 | 0.90 | TSHR (0.54) | TSHRTHRBPOLBAPEX1HTT | |
| Isopropyl Alcohol SCHEMBL4184688 | 0.88 | TSHR (0.53) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL27844781 | 0.88 | TSHR (0.53) | TSHRTHRBPOLBAPEX1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8188184-B2 | Additive and vehicle for inks, paints, coatings and adhesives | OMNITECH ENVIRONMENTAL, LLC (US) | 2012-05-29 | — | — | US | claimed |
| US-20110086957-A1 | ADDITIVE AND VEHICLE FOR INKS, PAINTS, COATINGS AND ADHESIVES | COOK LEROY JOHN | 2011-04-14 | — | — | US | claimed |
| WO-2006063266-A2 | ADDITIVE AND VEHICLE FOR INKS, PAINTS, COATINGS AND ADHESIVES | OMNITECH ENVIRONMENTAL, LLC (US) | 2006-06-15 | — | — | WO | claimed |
| US-20060128831-A1 | Additive and vehicle for inks, paints, coatings and adhesives | OMNITECH ENVIRONMENTAL, LLC | 2006-06-15 | — | — | US | claimed |
| US-4751277-A | OIL-RESISTANT RUBBER | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1988-06-14 | — | — | US | claimed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20230221639-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-07-13 | — | — | US | disclosed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| WO-2023120041-A1 | CLEANING AGENT COMPOSITION | 花王株式会社 | 2023-06-29 | — | — | WO | disclosed |
| CN-116171293-A | Amine modified polysaccharide carbamate/urea microcapsules | 恩盖普有限公司 | 2023-05-26 | — | — | CN | disclosed |
| US-4378445-A | EXTERIOR FINISHES FOR AUTOMOBILES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-03-29 | — | — | US | disclosed |
| EP-0055728-A4 | HYDROPHILIC INTERPOLYMERS OF ACRYLIC ACID AND AN ACRYLATE. | GOODRICH CO B F (US) | 1982-08-11 | — | — | EP | disclosed |
| EP-0055728-A1 | HYDROPHILIC INTERPOLYMERS OF ACRYLIC ACID AND AN ACRYLATE | The B.F. GOODRICH Company (US) | 1982-07-14 | — | — | EP | disclosed |
| EP-0047009-A1 | Hydrophilic interpolymers of acrylic acid and an olefin or a styrene | The B.F. GOODRICH Company (US) | 1982-03-10 | — | — | EP | disclosed |
| WO-1982000147-A1 | HYDROPHILIC INTERPOLYMERS OF ACRYLIC ACID AND AN ACRYLATE | GOODRICH CO B F (US) | 1982-01-21 | — | — | WO | disclosed |
| US-4255308-A | A DISPERSION COMPRISING A BINDER OF A METHYL METHACRYLATE POLYMER, A DISPERSANT OF AN ACRYLIC TERPOLYMER, AND A GRAFT POLYMER OF THE TWO; FINISHES FOR CARS AND TRUCKS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-03-10 | — | — | US | disclosed |
| US-4020192-A | AMINO ALKYL AMIDE ACRYLIC POLYMER | FUJI XEROX CO., LTD. (JA) | 1977-04-26 | — | — | US | disclosed |
| US-3954588-A | Electrocoating process for depositing a corrosion retardant layer on a metal substrate and sequentially electrocoating a cationic film-forming polymer coating | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-05-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | TSHR 3312/4885THRB 3525/4885POLB 938/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.