SCHEMBL1108679

SCHEMBL1108679

OC(COc1ccc(C2(c3ccc(OCC4CO4)cc3)c3ccccc3-c3ccccc32)cc1)COc1ccc(C2(c3ccc(OCC4CO4)cc3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.48
KMT2A Q03164 5/20 0.42
MEN1 O00255 4/20 0.42
ALDH1A1 P00352 4/20 0.40
TP53 P04637 3/20 0.40
TSHR P16473 3/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
HIF1A Q16665 2/20 0.40
CYP3A4 P08684 1/20 0.40
MAPT P10636 3/20 0.40
HPGD P15428 3/20 0.40
PKM P14618 2/20 0.40
LMNA P02545 2/20 0.40
CYP1A2 P05177 1/20 0.40
PPARG P37231 1/20 0.40
GAA P10253 1/20 0.40
RRM1 P23921 1/20 0.37
POLB P06746 1/20 0.36
KDM4E B2RXH2 1/20 0.36
OPRK1 P41145 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23588576 0.94 TDP1 (0.45) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL13735291 0.93 TDP1 (0.44) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL13827161 0.93 TDP1 (0.44) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL13735294 0.93 TDP1 (0.44) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL21829155 0.93 TDP1 (0.40) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL10049666 0.93 TDP1 (0.41) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL10049652 0.92 TDP1 (0.40) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL25912924 0.92 TDP1 (0.40) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL15700021 0.90 TDP1 (0.58) TDP1KMT2AMEN1ALDH1A1TP53
SCHEMBL157321 0.90 TDP1 (0.58) TDP1KMT2AMEN1ALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200319549-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT HAVING CURED FILM, ORGANIC EL DISPLAY, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY TORAY INDUSTRIES, INC. (JP) 2020-10-08 US disclosed
US-10689482-B2 Epoxy compound having alkoxysilyl group, composition and hardened material comprising same, use for same, and production method for epoxy compound having alkoxysilyl group KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2020-06-23 US disclosed
US-10689482-B2 Epoxy compound having alkoxysilyl group, composition and hardened material comprising same, use for same, and production method for epoxy compound having alkoxysilyl group KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2020-06-23 US disclosed
EP-2835373-B1 EPOXY COMPOUND HAVING ALKOXYSILYL GROUP, COMPOSITION AND HARDENED MATERIAL COMPRISING SAME, USE FOR SAME, AND PRODUCTION METHOD FOR EPOXY COMPOUND HAVING ALKOXYSILYL GROUP KOREA INST IND TECH (KR) 2019-09-11 EP disclosed
US-9841677-B2 Negative photosensitive resin composition, cured resin film, partition walls and optical element ASAHI GLASS COMPANY, LIMITED (JP) 2017-12-12 US disclosed
US-20160334707-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED RESIN FILM, PARTITION WALLS AND OPTICAL ELEMENT ASAHI GLASS COMPANY, LIMITED (JP) 2016-11-17 US disclosed
US-9459529-B2 Negative photosensitive resin composition, cured resin film, partition walls and optical element ASAHI GLASS COMPANY, LIMITED (JP) 2016-10-04 US disclosed
US-9146462-B2 Negative photosensitive resin composition, partition walls for optical device and production process thereof, process for producing optical device having the partition walls, and ink repellent solution ASAHI GLASS COMPANY, LIMITED (JP) 2015-09-29 US disclosed
US-20150234273-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED RESIN FILM, PARTITION WALLS AND OPTICAL ELEMENT ASAHI GLASS COMPANY, LIMITED (JP) 2015-08-20 US disclosed
US-20150219992-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED RESIN FILM, PARTITION WALLS AND OPTICAL ELEMENT ASAHI GLASS COMPANY, LIMITED (JP) 2015-08-06 US disclosed
US-8168354-B2 Photosensitive composition, partition walls, color filter and organic EL device ASAHI GLASS COMPANY, LIMITED (JP) 2012-05-01 US disclosed
US-8153340-B2 Photosensitive composition, partition walls and black matrix ASAHI GLASS COMPANY, LIMITED (JP) 2012-04-10 US disclosed
US-7972754-B2 Reduce ink residues on walls; uniformity in film thickness ASAHI GLASS COMPANY, LIMITED (JP) 2011-07-05 US disclosed
US-20110143282-A1 PHOTOSENSITIVE COMPOSITION, PARTITION WALLS, COLOR FILTER AND ORGANIC EL DEVICE ASAHI GLASS COMPANY, LIMITED (JP) 2011-06-16 US disclosed
US-20110117333-A1 NEGATIVE PHOTOSENSITIVE COMPOSITION, PARTITION WALLS FOR OPTICAL DEVICE USING IT AND OPTICAL DEVICE HAVING THE PARTITION WALLS ASAHI GLASS COMPANY, LIMITED (JP) 2011-05-19 US disclosed
US-20100273967-A1 FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS ASAHI GLASS COMPANY, LIMITED (JP) 2010-10-28 US disclosed
US-20100075237-A1 PROCESS FOR PRODUCING SUBSTRATE HAVING PARTITION WALLS AND PIXELS FORMED THEREON ASAHI GLASS COMPANY LIMITED (JP) 2010-03-25 US disclosed
US-20100072889-A1 PHOTOSENSITIVE COMPOSITION, PARTITION WALLS AND BLACK MATRIX ASAHI GLASS COMPANY, LIMITED (JP) 2010-03-25 US disclosed
US-20100035166-A1 PHOTOSENSITIVE COMPOSITION, PARTITION WALLS, BLACK MATRIX AND PROCESS FOR PRODUCING COLOR FILTER ASAHI GLASS COMPANY, LIMITED (JP) 2010-02-11 US disclosed
US-20080254388-A1 FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS ASAHI GLASS COMPANY, LIMITED (JP) 2008-10-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10689482-B2 Epoxy compound having alkoxysilyl group, composition and hardened material comprising same, use for same, and production method for epoxy compound having alkoxysilyl group ESD, ELL, ASH2L TDP1 2059/4885KMT2A 520/4885MEN1 2780/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.