⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19497234 | 0.90 | CEL (0.31) | — | |
| SCHEMBL11698690 | 0.88 | CEL (0.36) | — | |
| SCHEMBL1300624 | 0.83 | — | — | |
| SCHEMBL19608863 | 0.83 | — | — | |
| SCHEMBL10731203 | 0.81 | CEL (0.38) | — | |
| SCHEMBL11788351 | 0.81 | CEL (0.38) | — | |
| SCHEMBL4320756 | 0.81 | CEL (0.38) | — | |
| SCHEMBL2946185 | 0.81 | CEL (0.38) | — | |
| SCHEMBL3254629 | 0.79 | CEL (0.37) | — | |
| SCHEMBL10344336 | 0.71 | CA1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 489 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-57131792-A | — | — | None | — | — | JP | disclosed |
| JP-57145881-A | — | — | None | — | — | JP | disclosed |
| CN-114829539-B | Photochromic curable composition and photochromic optical article | 株式会社德山 | 2024-09-06 | — | — | CN | disclosed |
| US-12038689-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038689-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240219831-A1 | PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-11970557-B2 | Polymer containing photoacid generator | LG CHEM, LTD. (KR) | 2024-04-30 | — | — | US | disclosed |
| US-4804427-A | Composites via in-situ polymerization of composite matrices using a polymerization initiator bound to a fiber coating | ALLIED-SIGNAL INC. (US) | 1989-02-14 | — | — | US | disclosed |
| US-4785132-A | CATALYTIC HYDROGENATION OF HYDROXYBENZOIC ACIDS | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1988-11-15 | — | — | US | disclosed |
| US-4755617-A | Process for the preparation of 4'-hydroxybiphenyl-4-carboxyl acid | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1988-07-05 | — | — | US | disclosed |
| EP-0257727-A1 | Process for preparing cyclohexanonecarboxylic acid compounds | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1988-03-02 | — | — | EP | disclosed |
| EP-0240362-A2 | Process for the preparation of 4'-hydroxybiphenyl-4-carboxylic acid | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1987-10-07 | — | — | EP | disclosed |
| US-4607094-A | Thermosetting resin composition from aromatic cyanamide | HITACHI, LTD. (JP) | 1986-08-19 | — | — | US | disclosed |
| EP-0153603-A2 | Thermosetting resin composition, cured product, and production of cured product | HITACHI, LTD. (JP) | 1985-09-04 | — | — | EP | disclosed |
| JP-S57145881-A | NOVEL 2-OXABICYCLO(2,2,2)OCTANE-3-ONE DERIVATIVE | HISAMITSU PHARMACEUT CO INC | 1982-09-09 | — | — | JP | disclosed |
| JP-S57131792-A | NOVEL 2-OXABICYCLO(2.2.2)OCTAN-3-ONE DERIVATIVE | HISAMITSU PHARMACEUT CO INC | 1982-08-14 | — | — | JP | disclosed |
| US-4013582-A | Liquid crystal compounds and electro-optic devices incorporating them | RCA CORPORATION (US) | 1977-03-22 | — | — | US | disclosed |