SCHEMBL1109625

SCHEMBL1109625

CC1=C2CC(C(=O)O)C(C(=O)O)C(C)=C2CC(C(=O)O)C1C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.38
LMNA P02545 1/20 0.38
POLB P06746 1/20 0.38
GRM4 Q14833 4/20 0.32
CYP2C19 P33261 2/20 0.32
KMT2A Q03164 2/20 0.32
MEN1 O00255 1/20 0.32
CYP1A2 P05177 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
GRM8 O00222 1/20 0.32
GRM6 O15303 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
GABRR1 P24046 1/20 0.32
APLNR P35414 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7893064 0.89 ALDH1A1 (0.33) ALDH1A1LMNAPOLB
SCHEMBL27709934 0.82 ALDH1A1 (0.38) ALDH1A1LMNAPOLBGRM4CYP2C19
SCHEMBL7893065 0.79 POLB (0.31) POLB
SCHEMBL126022 0.73 ALDH1A1 (0.38) ALDH1A1LMNAPOLBGRM4CYP2C19
SCHEMBL9004827 0.67 TAAR1 (0.49) ALDH1A1LMNAPOLBKMT2ATDP1
SCHEMBL7489573 0.67 TAAR1 (0.49) ALDH1A1LMNAPOLBKMT2ATDP1
SCHEMBL9004833 0.67 TAAR1 (0.49) ALDH1A1LMNAPOLBKMT2ATDP1
SCHEMBL5477340 0.67 GABRR1 (0.35) ALDH1A1LMNAPOLBGRM4CYP2C19
SCHEMBL10422988 0.67 GABRR1 (0.35) ALDH1A1LMNAPOLBGRM4CYP2C19
SCHEMBL9470884 0.67 GABRR1 (0.35) ALDH1A1LMNAPOLBGRM4CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210179800-A1 DISPENSABLE POLYIMIDE AEROGEL PREPOLYMER, METHOD OF MAKING THE SAME, METHOD OF USING THE SAME, AND SUBSTRATE COMPRISING PATTERNED POLYIMIDE AEROGEL RAYTHEON COMPANY 2021-06-17 US claimed
WO-2024071066-A1 METAL-CLAD LAMINATED PLATE 日鉄ケミカル&マテリアル株式会社 2024-04-04 WO disclosed
CN-109679094-B Polyimide precursor, polyimide, laminate, and flexible device 日铁化学材料株式会社 2023-10-24 CN disclosed
CN-113874420-B Resin film and metal-clad laminate 日铁化学材料株式会社 2023-09-26 CN disclosed
US-11753517-B2 Dispensable polyimide aerogel prepolymer, method of making the same, method of using the same, and substrate comprising patterned polyimide aerogel RAYTHEON COMPANY (US) 2023-09-12 US disclosed
CN-116367413-A Metal-clad laminate and circuit board 日铁化学材料株式会社 2023-06-30 CN disclosed
CN-116353168-A Resin laminate, circuit board, electronic component, and electronic device 日铁化学材料株式会社 2023-06-30 CN disclosed
WO-2023106369-A1 POLYIMIDE FOR SPACECRAFT, POLYIMIDE FILM FOR SPACECRAFT, AND SPACECRAFT MEMBER INCLUDING SAME 日鉄ケミカル&マテリアル株式会社 2023-06-15 WO disclosed
CN-114945645-A Adhesive tape 株式会社有泽制作所 2022-08-26 CN disclosed
CN-114806395-A Polyimide precursor varnish and method for producing same, polyimide and method for producing same, flexible device, and laminate for wiring board 日铁化学材料株式会社 2022-07-29 CN disclosed
EP-0571899-B1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF LACKE & FARBEN (DE) 1994-11-02 EP disclosed
EP-0573866-B1 Method for forming patterned layers of heat-resistant polycondensates BASF LACKE & FARBEN (DE) 1994-11-02 EP disclosed
US-5350663-A Construction of electrical circuits and protective or insulating layers for electronic components BASF LACKE+ FARBEN AKTIENGESELLSCHAFT (DE) 1994-09-27 US disclosed
EP-0573866-A1 Method for forming patterned layers of heat-resistant polycondensates BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-15 EP disclosed
EP-0571899-A1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-01 EP disclosed
US-5238784-A PHOTOSENSITIVE RESIN COMPOSITION WITH POLYAMIC ACID POLYMER SUMITOMO BAKELITE COMPANY LIMITED (JP) 1993-08-24 US disclosed
US-5206337-A Heat resistance, moldability, workability SUMITOMO BAKELITE COMPANY LIMITED (JP) 1993-04-27 US disclosed
EP-0456512-A2 Polyimidesiloxane oligomer SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-11-13 EP disclosed
EP-0430220-A2 Photosensitive resin composition and semiconductor apparatus using it SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-06-05 EP disclosed
EP-0430221-A2 Photosensitive resin composition SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-06-05 EP disclosed