Formaldehyde

Formaldehyde

SCHEMBL11097624

C=O.[N-]=[N+]=NNc1ccccc1

nearest known ligand 0.39

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.39
TDP1 Q9NUW8 4/20 0.39
CYP1A1 P04798 1/20 0.39
CYP1B1 Q16678 1/20 0.39
NOX1 Q9Y5S8 1/20 0.38
DEPTOR Q8TB45 1/20 0.36
ALDH1A1 P00352 7/20 0.35
HSD17B10 Q99714 3/20 0.35
CTSD P07339 1/20 0.35
HTT P42858 2/20 0.34
MEN1 O00255 4/20 0.33
KMT2A Q03164 4/20 0.33
RAB9A P51151 3/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
MAPK1 P28482 2/20 0.33
CASP3 P42574 2/20 0.33
SENP8 Q96LD8 2/20 0.33
SENP7 Q9BQF6 2/20 0.33
SENP6 Q9GZR1 2/20 0.33
TP53 P04637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL710048 0.93 TDP1 (0.43) TSHRTDP1CYP1A1CYP1B1NOX1
Hydrochloric Acid SCHEMBL711911 0.91 TDP1 (0.41) TSHRTDP1CYP1A1CYP1B1NOX1
SCHEMBL28454114 0.71 ALDH1A1 (0.37) TDP1ALDH1A1HTTMEN1KMT2A
SCHEMBL20489080 0.71 MAPT (0.38) TSHRCYP1A1ALDH1A1HSD17B10HTT
SCHEMBL15521415 0.67 FFAR1 (0.50) ALDH1A1
SCHEMBL4282436 0.66
SCHEMBL143319 0.66
Benzene SCHEMBL28203363 0.66 TDP1 (0.48) TSHRTDP1CYP1A1CYP1B1NOX1
Formaldehyde SCHEMBL27489743 0.65 CA1 (0.47) CYP1A1CYP1B1NOX1ALDH1A1TP53
SCHEMBL9055960 0.65 TDP1 (0.67) TSHRTDP1CYP1A1CYP1B1NOX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4455364-A ETCHING RESISTANCE KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-06-19 US disclosed